SCHEMBL4085537

SCHEMBL4085537

CC(C(=O)O)=C(C)C12CC3(C)CC(C)(CC(O)(C3)C1)C2

nearest known ligand 0.41

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.41
RAB9A P51151 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.34
ALDH1A1 P00352 1/20 0.34
DPP4 P27487 1/20 0.33
TSHR P16473 1/20 0.32
HSD17B10 Q99714 1/20 0.32
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4095016 0.96 PKM (0.36) PKMRAB9ASMN1; SMN2ALDH1A1DPP4
SCHEMBL4102881 0.86 SMN1; SMN2 (0.34) PKMRAB9ASMN1; SMN2TSHRHSD17B10
SCHEMBL4093641 0.85
SCHEMBL4100138 0.83
SCHEMBL1733355 0.78 PKM (0.48) PKMRAB9ASMN1; SMN2ALDH1A1DPP4
SCHEMBL7734562 0.78 PKM (0.48) PKMRAB9ASMN1; SMN2ALDH1A1DPP4
SCHEMBL4089963 0.77 SMN1; SMN2 (0.41) PKMRAB9ASMN1; SMN2ALDH1A1TSHR
SCHEMBL4093695 0.77 PKM (0.37) PKMRAB9ASMN1; SMN2TSHRHSD17B10
SCHEMBL4098646 0.77 MEN1 (0.41) SMN1; SMN2MEN1KMT2A
SCHEMBL4090170 0.76 PKM (0.36) PKMRAB9ASMN1; SMN2TSHRHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed