Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | DPP4 | P27487 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | GRM1 | Q13255 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5607856 | 0.95 | PKM (0.43) | PKMRAB9ASMN1; SMN2ALDH1A1DPP4 | |
| SCHEMBL5607548 | 0.95 | PKM (0.43) | PKMRAB9ASMN1; SMN2ALDH1A1DPP4 | |
| SCHEMBL301039 | 0.88 | PKM (0.59) | PKMRAB9ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL2745710 | 0.85 | PKM (0.56) | PKMRAB9ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL13738157 | 0.85 | — | — | |
| SCHEMBL6226927 | 0.85 | PKM (0.35) | PKMRAB9ASMN1; SMN2ALDH1A1 | |
| Hydrochloric Acid SCHEMBL5614131 | 0.83 | PKM (0.54) | PKMRAB9ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL5080859 | 0.83 | PKM (0.52) | PKMRAB9ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL16038181 | 0.83 | — | — | |
| SCHEMBL7734562 | 0.82 | PKM (0.48) | PKMRAB9ASMN1; SMN2ALDH1A1DPP4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105980347-B | Method for producing novel alicyclic ester compound, (meth) acrylic copolymer obtained by polymerizing the same, and photosensitive resin composition containing the same | 三菱瓦斯化学株式会社 | 2019-08-16 | — | — | CN | disclosed |
| EP-3106477-B1 | (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-08-29 | — | — | EP | disclosed |
| US-10005714-B2 | (Meth)acrylic acid ester compound and production method therefor | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9994513-B2 | Method for producing novel ali cyclic ester compound, novel alicyclic ester compound, (meth)acrylic copolymer produced by polymerizing said compound, and photosensitive resin composition using said copolymer | MITSUBISHI GAS CHEMICAL, INC. (JP) | 2018-06-12 | — | — | US | disclosed |
| EP-2990425-B1 | NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| CN-105960419-B | (methyl) acrylate compounds and its manufacture method | 三菱瓦斯化学株式会社 | 2018-03-16 | — | — | CN | disclosed |
| US-20170008830-A1 | (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-01-12 | — | — | US | disclosed |
| EP-3106454-A1 | METHOD FOR PRODUCING NOVEL ALICYCLIC ESTER COMPOUND, NOVEL ALICYCLIC ESTER COMPOUND, (METH)ACRYLIC COPOLYMER PRODUCED BY POLYMERIZING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION USING SAID COPOLYMER | Mitsubishi Gas Chemical Company, Inc. (JP) | 2016-12-21 | — | — | EP | disclosed |
| EP-3106477-A1 | (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR | Mitsubishi Gas Chemical Company, Inc. (JP) | 2016-12-21 | — | — | EP | disclosed |
| US-20160355461-A1 | METHOD FOR PRODUCING NOVEL ALI CYCLIC ESTER COMPOUND, NOVEL ALICYCLIC ESTER COMPOUND, (METH)ACRYLIC COPOLYMER PRODUCED BY POLYMERIZING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION USING SAID COPOLYMER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-12-08 | — | — | US | disclosed |
| US-9051256-B1 | Process for producing hydroxy adamantane carboxylic acid compounds | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-06-09 | — | — | US | disclosed |
| EP-1443363-B1 | Photoresist composition | DAICEL CHEM (JP) | 2013-07-10 | — | — | EP | disclosed |
| EP-0999474-B1 | Photoresist resin composition and method for forming a pattern | DAICEL CHEM (JP) | 2011-11-23 | — | — | EP | disclosed |
| US-RE39744-E1 | Adamantane derivatives and process for producing them | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2007-07-24 | — | — | US | disclosed |
| EP-1602975-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-12-07 | — | — | EP | disclosed |
| EP-1443363-A2 | Compounds for photoresist and resin composition for photoresist | Daicel Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-6392104-B1 | CHEMICAL INTERMEDIATES FOR DRUGS, AGRICULTURE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-21 | — | — | US | disclosed |
| US-6391520-B1 | ADAMANTANE COMPOUND OR POLYMER AND PHOTOACID GENERATORS; ETCHING RESISTANCE; SOLUBILIZABLE BY IRRADIATION WITH LIGHT; MINUTE PATTERNS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-21 | — | — | US | disclosed |
| EP-0999474-A1 | COMPOUNDS FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2000-05-10 | — | — | EP | disclosed |
| EP-0927711-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THEM | Daicel Chemical Industries, Ltd. (JP) | 1999-07-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10005714-B2 | (Meth)acrylic acid ester compound and production method therefor | AMD1, ALDH7A1, TMEM164 | PKM 4304/4885RAB9A 2973/4885SMN1; SMN2 4663/4885 |
| US-20160355461-A1 | METHOD FOR PRODUCING NOVEL ALI CYCLIC ESTER COMPOUND, NOVEL ALICYCLIC ESTER COMPOUND, (METH)ACRYLIC COPOLYMER PRODUCED BY POLYMERIZING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION USING SAID COPOLYMER | ASPH, LTA, TAS2R42 | PKM 4687/4885RAB9A 2517/4885SMN1; SMN2 3281/4885 |
| US-20170008830-A1 | (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR | AMD1, ALDH7A1, TMEM164 | PKM 4331/4885RAB9A 2840/4885SMN1; SMN2 4653/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.