Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4093352 | 0.90 | TSHR (0.36) | TSHRHSD17B10 | |
| SCHEMBL4089966 | 0.90 | TSHR (0.33) | TSHRHSD17B10 | |
| SCHEMBL5935899 | 0.86 | TSHR (0.31) | TSHRHSD17B10 | |
| SCHEMBL5935971 | 0.86 | PKM (0.30) | — | |
| SCHEMBL701243 | 0.83 | DPP4 (0.33) | — | |
| SCHEMBL701252 | 0.83 | DPP4 (0.36) | — | |
| SCHEMBL4097647 | 0.81 | TSHR (0.31) | TSHRHSD17B10 | |
| SCHEMBL4102249 | 0.80 | TSHR (0.30) | TSHRHSD17B10 | |
| SCHEMBL5608366 | 0.78 | TSHR (0.41) | TSHRHSD17B10 | |
| SCHEMBL5608040 | 0.78 | TSHR (0.41) | TSHRHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2003148-B1 | RADIATION-SENSITIVE RESIN COMPOSITION COMPRISING A FLUORINE-CONTAINING POLYMER | JSR CORP (JP) | 2017-07-19 | — | — | EP | disclosed |
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9348226-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| US-20160062237-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9213236-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-20140162190-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2014-06-12 | — | — | US | disclosed |
| US-8697343-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20090202945-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20060234154-A1 | Mixture containing acid generator and free radical catalyst; acrylated ester monomer | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |