SCHEMBL4085984

SCHEMBL4085984

C=C(CCCC(=O)OC(C)(C)CC)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 1/20 0.35
TSHR P16473 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4084580 0.89 TET2 (0.37) TET2
SCHEMBL4087831 0.84 EPHX2 (0.38) TET2TSHR
SCHEMBL25711507 0.82 TSHR (0.52) TSHR
SCHEMBL21982916 0.78 TSHR (0.38) TSHR
SCHEMBL19821838 0.78 TSHR (0.60) TSHR
SCHEMBL11509336 0.77 CES1 (0.42) TSHR
SCHEMBL142215 0.77 TSHR (0.39) TSHR
SCHEMBL9847901 0.77 TSHR (0.37) TSHR
SCHEMBL27544213 0.77 CYP1A2 (0.52) TSHR
SCHEMBL8162633 0.76 DGKA (0.50) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7494759-B2 Positive resist compositions and process for the formation of resist patterns with the same TOKYO OHKA KOGYO CO., LTD. (JP) 2009-02-24 US disclosed
US-20070224538-A1 Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 US disclosed