Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.38 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.32 |
| ▸ | TBXAS1 | P24557 | 2/20 | 0.32 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.32 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.32 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.32 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | STING1 | Q86WV6 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4079989 | 0.88 | TET2 (0.41) | EPHX2TET2TSHRCYP2D6HDAC8 | |
| SCHEMBL9644895 | 0.85 | EPHX2 (0.41) | EPHX2TSHRCYP2D6HDAC8HDAC1 | |
| SCHEMBL4085984 | 0.84 | TET2 (0.35) | TET2TSHR | |
| SCHEMBL1639757 | 0.83 | TSHR (0.50) | EPHX2TSHRCYP2D6HDAC8HDAC1 | |
| Hydrochloric Acid SCHEMBL7239543 | 0.81 | TSHR (0.48) | EPHX2TSHRCYP2D6HDAC8HDAC1 | |
| SCHEMBL645859 | 0.79 | TSHR (0.58) | TSHRMEN1KMT2ATDP1 | |
| SCHEMBL134923 | 0.79 | EPHX2 (0.46) | EPHX2TSHRCYP2D6HDAC8HDAC1 | |
| SCHEMBL8167312 | 0.78 | EPHX2 (0.42) | EPHX2TSHRHDAC8HDAC1HDAC2 | |
| SCHEMBL4838871 | 0.78 | TET2 (0.42) | TET2CYP2D6HDAC8HDAC1HDAC2 | |
| Ammonia Solution, Strong SCHEMBL27537263 | 0.78 | TSHR (0.56) | TSHRMEN1KMT2ATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0843220-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2003-02-19 | — | — | EP | claimed |
| US-7494759-B2 | Positive resist compositions and process for the formation of resist patterns with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20070224538-A1 | Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |