Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | HCAR3 | P49019 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | PTPN1 | P18031 | 4/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.43 |
| ▸ | AGTR2 | P50052 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL341842 | 0.90 | TP53 (0.46) | TP53ALDH1A1ALOX15HCAR3KDM4E | |
| SCHEMBL3691710 | 0.89 | ALDH1A1 (0.55) | TP53ALDH1A1ALOX15KDM4EPOLB | |
| Hydrochloric Acid SCHEMBL15209621 | 0.88 | ALDH1A1 (0.53) | TP53ALDH1A1ALOX15KDM4EPOLB | |
| SCHEMBL3784268 | 0.88 | ALDH1A1 (0.50) | TP53ALDH1A1KDM4EPOLBGAA | |
| SCHEMBL6569152 | 0.87 | TSHR (0.57) | TP53ALDH1A1HCAR3KDM4EPOLB | |
| SCHEMBL5862952 | 0.86 | ALDH1A1 (0.49) | TP53ALDH1A1KDM4EPOLBGAA | |
| SCHEMBL9303599 | 0.86 | ALDH1A1 (0.49) | TP53ALDH1A1KDM4EPOLBGAA | |
| SCHEMBL1668024 | 0.85 | TP53 (0.53) | TP53ALDH1A1ALOX15KDM4EGAA | |
| SCHEMBL27666331 | 0.84 | TP53 (0.47) | TP53ALDH1A1HCAR3GAATSHR | |
| SCHEMBL7476350 | 0.83 | ALDH1A1 (0.48) | ALDH1A1ALOX15KDM4EPOLBGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-RE35135-E | Dental material; mixture of radical-polymerizable monomer, alpha-ketocarbonyl and aromatic amine | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1995-12-26 | — | — | US | claimed |
| CN-105607426-B | Polymer, chemical amplification negative resist composition and pattern forming method | SHIN ETSU CHEMICAL COMPANY (JP) | 2019-11-01 | — | — | CN | disclosed |
| EP-2491915-B1 | EASILY REMOVABLE CURABLE COMPOSITION FOR DENTAL USE | SUN MEDICAL CO LTD (JP) | 2019-07-03 | — | — | EP | disclosed |
| CN-104330955-B | For the chemical-amplification positive anti-corrosion agent composition and patterning method of EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-05-25 | — | — | CN | disclosed |
| CN-104199255-B | Chemistry amplification negative resist composition and patterning method for EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-03-13 | — | — | CN | disclosed |
| CN-102243439-B | Chemically amplified positive resist composition for electron beam or extreme ultraviolet lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-16 | — | — | CN | disclosed |
| CN-102129172-B | The method of negative resist composition and formation pattern | SHIN-ETSU CHEMICAL INDUSTRY CO., LTD. (JP) | 2015-09-09 | — | — | CN | disclosed |
| CN-102096321-B | Negative resist composition and patterning process | SHINETSU CHEMICAL CO | 2015-05-13 | — | — | CN | disclosed |
| CN-104330955-A | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR EB OR EUV LITHOGRAPHY AND PATTERNING PROCESS | SHINETSU CHEMICAL CO | 2015-02-04 | — | — | CN | disclosed |
| CN-102221783-B | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO | 2015-01-28 | — | — | CN | disclosed |
| US-5530038-A | CONTAINING UNSATURATED MONOMER WITH ACIDIC GROUP, UNSATURATED MONOMER WITH HYDROXYL GROUP, POLYMERIZATION INITIATOR, AMINE COMPOUND, ZIRCONIUM OXIDE AND ORGANIC COMPOSITE FILLERS | SUN MEDICAL CO., LTD. (JP) | 1996-06-25 | — | — | US | disclosed |
| EP-0684034-A1 | Primer solution composition for dental bonding | SUN MEDICAL CO., LTD. (JP) | 1995-11-29 | — | — | EP | disclosed |
| EP-0649410-A1 | ANILIDE DERIVATIVES. | GLAXO LAB SA (FR) | 1995-04-26 | — | — | EP | disclosed |
| WO-1994001408-A1 | ANILIDE DERIVATIVES | LABORATOIRES GLAXO S.A. (FR) | 1994-01-20 | — | — | WO | disclosed |
| US-5219693-A | Sensitivity, printing image quality | IWATSU ELECTRIC CO., LTD. (JP) | 1993-06-15 | — | — | US | disclosed |
| US-4985322-A | Process and apparatus for producing printing plates | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1991-01-15 | — | — | US | disclosed |
| US-4868079-A | RECORDING | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1989-09-19 | — | — | US | disclosed |
| US-4859555-A | Electrophotographic printing plate comprising disazo and perynone compounds, hole transport material and alkali soluble resin | DAINIPPON INK & CHEMICAL, INC. (JP) | 1989-08-22 | — | — | US | disclosed |
| US-4699862-A | ZINC OXIDE, PHTHALO CYANINE COMPOUND, HOLE TRANSPORTING MATERIAL, BINDER | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1987-10-13 | — | — | US | disclosed |
| US-4093577-A | ESTERIFYING WITH AN UNSATURATED FATTY ACID A RESIN PRODUCED FROM A DIALKYLAMINOBENZOIC ACID OR A CARBOXY-CONTAINING BENZOPHENONE WITH A POLYBASIC ACID AND A POLYHYDRIC ALCOHOL | TOYO INK MANUFACTURING CO., LTD. (JA) | 1978-06-06 | — | — | US | disclosed |