SCHEMBL4087294

SCHEMBL4087294

CC(C)O[Si](CCl)(c1ccccc1)c1ccccc1

nearest known ligand 0.33

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32
ALDH1A1 P00352 2/20 0.31
LMNA P02545 2/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
TP53 P04637 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704897 0.83 TSHR (0.33) TSHRALDH1A1LMNAL3MBTL1
SCHEMBL704953 0.83 TSHR (0.37) TSHRALDH1A1LMNAL3MBTL1
SCHEMBL10949189 0.82 SLC6A2 (0.34) LMNAL3MBTL1SMN1; SMN2
SCHEMBL704361 0.82 TSHR (0.32) TSHRALDH1A1LMNAL3MBTL1TP53
SCHEMBL10947571 0.81 IDO1 (0.31) SMN1; SMN2
SCHEMBL706147 0.80 TSHR (0.32) TSHRALDH1A1LMNAL3MBTL1
SCHEMBL4077495 0.80 LMNA (0.34) TSHRALDH1A1LMNAL3MBTL1TP53
SCHEMBL4079957 0.80 TSHR (0.32) TSHRALDH1A1LMNAL3MBTL1
SCHEMBL703534 0.80 TSHR (0.32) TSHRALDH1A1LMNAL3MBTL1
SCHEMBL4077506 0.80 TSHR (0.32) TSHRALDH1A1LMNAL3MBTL1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed