SCHEMBL4092592

SCHEMBL4092592

CC(C(=O)O)=C(C)C12CC3CC(C)(CC(C#N)(C3)C1)C2

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
MAPT P10636 1/20 0.35
DPP4 P27487 1/20 0.35
GAA P10253 2/20 0.32
ALOX12 P18054 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
ALOX15 P16050 1/20 0.32
HTT P42858 1/20 0.32
P2RX7 Q99572 1/20 0.30
NPC1 O15118 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15771635 0.90
SCHEMBL6227789 0.84 MEN1 (0.42) MEN1KMT2AMAPTDPP4GAA
SCHEMBL4102904 0.84 PREP (0.34) DPP4
SCHEMBL4093646 0.82 NPSR1 (0.32)
SCHEMBL4092133 0.81 ALDH1A1 (0.33)
SCHEMBL4098563 0.80 ALDH1A1 (0.35) MEN1KMT2AMAPTGAASMN1; SMN2
SCHEMBL4090170 0.80 PKM (0.36) SMN1; SMN2
SCHEMBL4091630 0.80 PKM (0.32) SMN1; SMN2
SCHEMBL4040081 0.78 MEN1 (0.39) MEN1KMT2AMAPTDPP4GAA
SCHEMBL4098646 0.77 MEN1 (0.41) MEN1KMT2AMAPTGAAALOX12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed