SCHEMBL4100262

SCHEMBL4100262

COC(=O)C12CC3(C)CC(C#N)(C1)CC(C(C)=C(C)C(=O)O)(C3)C2

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.34
TSHR P16473 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4091630 0.87 PKM (0.32) SMN1; SMN2
SCHEMBL4090170 0.87 PKM (0.36) SMN1; SMN2TSHRHSD17B10
SCHEMBL4103900 0.87 SMN1; SMN2 (0.38) SMN1; SMN2TSHRHSD17B10
SCHEMBL4089963 0.86 SMN1; SMN2 (0.41) SMN1; SMN2TSHRHSD17B10
SCHEMBL4037889 0.84 TSHR (0.44) SMN1; SMN2TSHRHSD17B10
SCHEMBL4100138 0.81
SCHEMBL4102881 0.81 SMN1; SMN2 (0.34) SMN1; SMN2TSHRHSD17B10
SCHEMBL4096020 0.78
SCHEMBL4093646 0.78 NPSR1 (0.32)
SCHEMBL22276169 0.78 LMNA (0.32) SMN1; SMN2TSHRHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed