Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.42 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.42 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.42 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.42 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7133261 | 0.84 | ALDH1A1 (0.48) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL7133279 | 0.83 | ALDH1A1 (0.46) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL13609695 | 0.83 | ALDH1A1 (0.46) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL16536226 | 0.81 | ALDH1A1 (0.44) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL16536952 | 0.81 | ALDH1A1 (0.44) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL4763549 | 0.80 | CA1 (0.39) | ALDH1A1TDP1 | |
| SCHEMBL7130529 | 0.79 | ALDH1A1 (0.42) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL7131360 | 0.79 | CHRNB2 (0.45) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL7134996 | 0.79 | CHRNB2 (0.45) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL5888569 | 0.79 | ALDH1A1 (0.42) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 293 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118599032-A | Method for preparing narrow-distribution vinyl aromatic resin for copper-clad plate based on double-end functional initiator | 大连理工大学 | 2024-09-06 | — | — | CN | claimed |
| EP-3532898-B1 | METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER | FRAUNHOFER GES FORSCHUNG (DE) | 2024-07-31 | — | — | EP | claimed |
| CN-116041596-B | Star polar polymer and preparation method thereof | 辽宁科之镁新材料研究有限公司 | 2024-04-26 | — | — | CN | claimed |
| CN-117777387-A | Block resin with narrow molecular weight distribution for photoresist and preparation method thereof | 苏州威迈芯材半导体有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-117586681-A | Preparation method of bottom anti-reflection coating resin with high peel strength | 苏州威迈芯材半导体有限公司 | 2024-02-23 | — | — | CN | claimed |
| CN-116041596-A | Star polar polymer and preparation method thereof | 辽宁科之镁新材料研究有限公司 | 2023-05-02 | — | — | CN | claimed |
| CN-110862492-B | Silane modified polyether resin and preparation method and application thereof | 万华化学集团股份有限公司 | 2022-04-19 | — | — | CN | claimed |
| US-11292859-B2 | Method for producing a polymer by nitroxyl-controlled polymerisation, and polymer | FRAUNHOFER-GESELLSCHAFT ZURFÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) | 2022-04-05 | — | — | US | claimed |
| CN-110862492-A | Silane modified polyether resin and preparation method and application thereof | 万华化学集团股份有限公司 | 2020-03-06 | — | — | CN | claimed |
| EP-3532898-A1 | METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER | Fraunhofer Gesellschaft zur Förderung der Angewand (DE) | 2019-09-04 | — | — | EP | claimed |
| US-20070060692-A1 | Polymer composition with elastomeric properties at wide temperature ranges and process for the preparation thereof | DYNASOL ELASTOMEROS, S.A. DE C.V. (MX) | 2007-03-15 | — | — | US | claimed |
| CN-1860176-A | Polymeric composition having elastomeric properties over wide temperature ranges, and preparation method thereof | DYNASOL ELASTOMEROS SA (MX) | 2006-11-08 | — | — | CN | claimed |
| EP-1661949-A1 | POLYMERIC COMPOSITION HAVING ELASTOMERIC PROPERTIES OVER WIDE TEMPERATURE RANGES, AND PREPARATION METHOD THEREOF | Dynasol Elastomeros, S.A. De C.V. (MX) | 2006-05-31 | — | — | EP | claimed |
| WO-2005108473-A1 | SEMICONDUCTOR NANOPARTICLE-ENCAPSULATING VINYL POLYMER, VINYL POLYMER MIXTURE INCLUDINGTHE SAME, AND PROCESS OF PREPARING THE SAME | SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION (KR) | 2005-11-17 | — | — | WO | claimed |
| US-5663260-A | Hyperbranched copolymers from AB monomers and C monomers | CORNELL RESEARCH FOUNDATION, INC. (US) | 1997-09-02 | — | — | US | claimed |
| US-5110709-A | Photoresists of excellent image resolution | FUJI PHOTO FILM CO., LTD. (JP) | 1992-05-05 | — | — | US | claimed |
| US-4918152-A | COPOLYMERIZATION WITH A MALEIMIDE AND POLYFUNCTIONAL MONOMER; SMALL BIREFRINGENCE, HIGH REFRACTIVE INDEX; HIGH SPEED | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-04-17 | — | — | US | claimed |
| EP-0178208-B1 | PHOTOSENSITIVE FILM OF A SILICON-CONTAINING POLYMER AND ITS USE AS A MASK IN PHOTOLITHOGRAPHIC PROCESSES | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 1989-04-12 | — | — | EP | claimed |
| US-4770977-A | Silicon-containing polymer and its use as a masking resin in a lithography process | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 1988-09-13 | — | — | US | claimed |
| EP-0178208-A1 | Photosensitive film of a silicon-containing polymer and its use as a mask in photolithographic processes | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 1986-04-16 | — | — | EP | claimed |