SCHEMBL410979

SCHEMBL410979

COCCC(C)(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20094230 0.85 ALDH1A1 (0.39)
SCHEMBL1394318 0.82
SCHEMBL31267570 0.80 ALDH1A1 (0.45)
SCHEMBL19018316 0.80 ALDH1A1 (0.45)
SCHEMBL14724772 0.80 ALDH1A1 (0.35)
SCHEMBL4058311 0.78 ALDH1A1 (0.43)
SCHEMBL11212814 0.78 ALDH1A1 (0.32)
SCHEMBL9315416 0.78 ALDH1A1 (0.56)
SCHEMBL9864473 0.77
SCHEMBL19339314 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 309 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113135922-B Azepane [4,3,2-cd ] isoindol-2-one derivatives and application thereof 中国药科大学 2023-05-30 CN claimed
CN-113135922-A Azacycloheptane [4,3,2-cd ] isoindol-2-one derivatives and application thereof 中国药科大学 2021-07-20 CN claimed
US-9663538-B2 Aluminum compound, thin-film forming raw material, and method for producing thin film ADEKA CORPORATION (JP) 2017-05-30 US claimed
EP-0030109-B1 PROCESS FOR PRODUCING ISOPRENE KURARAY CO., LTD. (JP) 1983-10-05 EP claimed
US-4381416-A Process for producing isoprene KURARAY CO., LTD. (JP) 1983-04-26 US claimed
EP-0030109-A1 Process for producing isoprene KURARAY CO., LTD. (JP) 1981-06-10 EP claimed
US-12630570-B2 Organometallic adduct compound and method of manufacturing integrated circuit device by using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-05-19 US disclosed
CN-115362157-B Zinc compound, raw material for forming thin film, and method for producing same 株式会社ADEKA 2026-05-15 CN disclosed
EP-4130010-B1 ZINC COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM ADEKA CORP (JP) 2026-04-29 EP disclosed
EP-4722309-A1 AQUEOUS INKJET INK AND PRINTED MATTER artience Co., Ltd. (JP) 2026-04-08 EP disclosed
EP-4067365-B1 COMPOUND, THIN FILM-FORMING MATERIAL, AND METHOD FOR PRODUCING THIN FILM ADEKA CORP (JP) 2026-03-25 EP disclosed
US-12577660-B2 Compound, thin-film forming raw material, thin-film, and method of producing thin-film ADEKA CORPORATION (JP) 2026-03-17 US disclosed
US-20260055506-A1 HALOGEN COMPOUND ADEKA CORPORATION (JP) 2026-02-26 US disclosed
EP-1264874-A1 Softener composition Kao Corporation (JP) 2002-12-11 EP disclosed
EP-1249488-A1 Softener composition Kao Corporation (JP) 2002-10-16 EP disclosed
EP-0030109-B1 PROCESS FOR PRODUCING ISOPRENE KURARAY CO., LTD. (JP) 1983-10-05 EP disclosed
US-4381416-A Process for producing isoprene KURARAY CO., LTD. (JP) 1983-04-26 US disclosed
US-4381416-A Process for producing isoprene KURARAY CO., LTD. (JP) 1983-04-26 US disclosed
EP-0030109-A1 Process for producing isoprene KURARAY CO., LTD. (JP) 1981-06-10 EP disclosed
EP-0030109-A1 Process for producing isoprene KURARAY CO., LTD. (JP) 1981-06-10 EP disclosed