SCHEMBL4116876

SCHEMBL4116876

CCC(=O)c1cccc(C)c1O

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.62
KDM4E B2RXH2 2/20 0.62
HPGD P15428 2/20 0.62
HSD17B10 Q99714 1/20 0.62
KMT2A Q03164 2/20 0.53
CYP3A4 P08684 1/20 0.53
CYP2C9 P11712 1/20 0.53
RXFP1 Q9HBX9 1/20 0.49
NPC1 O15118 3/20 0.49
RAB9A P51151 3/20 0.49
HTT P42858 1/20 0.49
SMN1; SMN2 Q16637 1/20 0.49
GAA P10253 3/20 0.47
MAPT P10636 2/20 0.47
PLAU P00749 2/20 0.45
F2 P00734 1/20 0.45
F10 P00742 1/20 0.45
PLG P00747 1/20 0.45
PLAT P00750 1/20 0.45
KLK1 P06870 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31619208 0.82 ALDH1A1 (0.60) ALDH1A1KDM4EHPGDHSD17B10KMT2A
SCHEMBL10948371 0.82 ALDH1A1 (0.60) ALDH1A1KDM4EHPGDHSD17B10KMT2A
SCHEMBL7811439 0.82 ALDH1A1 (0.55) ALDH1A1KDM4EHPGDHSD17B10KMT2A
SCHEMBL30578286 0.82 ESR1 (0.46) ALDH1A1KDM4EHPGDHSD17B10KMT2A
SCHEMBL1606580 0.82 HSP90AB1 (0.55) ALDH1A1HPGDHSD17B10KMT2AHTT
SCHEMBL581465 0.82 ESR1 (0.46) ALDH1A1KDM4EHPGDHSD17B10KMT2A
SCHEMBL364889 0.81 ERCC5 (0.60) ALDH1A1HPGDKMT2ANPC1RAB9A
SCHEMBL31901342 0.81 ERCC5 (0.60) ALDH1A1HPGDKMT2ANPC1RAB9A
SCHEMBL2763225 0.80 ALDH1A1 (0.57) ALDH1A1KDM4EHPGDHSD17B10KMT2A
SCHEMBL11651879 0.80 KDM4E (0.47) ALDH1A1KDM4EHPGDHSD17B10KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119240989-A Zero-emission treatment process for spray weaving wastewater 安徽美自然环境科技有限公司 2025-01-03 CN claimed
CN-119240989-A Zero-emission treatment process for spray weaving wastewater 安徽美自然环境科技有限公司 2025-01-03 CN disclosed
EP-3841131-B1 CURABLE COMPOSITIONS FOR PRESSURE-SENSITIVE ADHESIVES 3M INNOVATIVE PROPERTIES COMPANY (US) 2024-09-25 EP disclosed
US-20230089713-A1 QUANTUM DOT COMPOSITE, OPTICAL FILM AND BACKLIGHT MODULE NAN YA PLASTICS CORPORATION (TW) 2023-03-23 US disclosed
US-11578162-B2 Curable compositions for pressure-sensitive adhesives 3M INNOVATIVE PROPERTIES COMPANY (US) 2023-02-14 US disclosed
US-20230042180-A1 HIGH-TEMPERATURE SHAPE MEMORY PHOTOPOLYMERS AND METHODS OF MAKING BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE 2023-02-09 US disclosed
EP-3983770-A1 SENSOR ARRANGEMENT, METHOD FOR PRODUCTION THEREOF AND USE OF THE SENSOR ARRANGEMENT Forschungszentrum Jülich GmbH (DE) 2022-04-20 EP disclosed
CN-112717898-B Preparation method of collagen-based hydrogel adsorbent for treating Cr (III) in leather-making wastewater 四川大学 2022-03-04 CN disclosed
CN-112717898-A Preparation method of collagen-based hydrogel adsorbent for treating Cr (III) in leather-making wastewater 四川大学 2021-04-30 CN disclosed
CN-112585171-A Curable compositions for pressure sensitive adhesives 3M创新有限公司 2021-03-30 CN disclosed
US-20090145452-A1 DEVICES AND METHODS OF USE FOR TREATMENT OF SKIN AND HAIR LIVING PROOF, INC. (US) 2009-06-11 US disclosed
EP-1928931-A2 CROSSLINKED POLYMERS WITH AMINE BINDING GROUPS 3M Innovative Properties Company (US) 2008-06-11 EP disclosed
WO-2007134224-A2 DEVICES AND METHODS OF USE FOR TREATMENT OF SKIN AND HAIR LIVING PROOF, INC. (US) 2007-11-22 WO disclosed
WO-2007040968-A2 CROSSLINKED POLYMERS WITH AMINE BINDING GROUPS 3M INNOVATIVE PROPERTIES COMPANY (US) 2007-04-12 WO disclosed
CN-1543455-A 3-phenoxy-4-pyridazinol derivatives and herbicidal compositions containing the same 三共农业株式会社 2004-11-03 CN disclosed
US-6045975-A A CURABLE VARNISH BLENDS COMPRISING A NON-PHOTOSENSITIVE POLYIMIDE PRECURSOR, A (METH)ACRYLATE ESTER POLYMERIZABLE MONOMER OR OLIGOMER, A PHOTOINITIATOR; USE IN THE PRODUCTION OF CIRCUIT BOARDS AND SEMICONDUCTOR DEVICES FUJITSU LIMITED (JP) 2000-04-04 US disclosed
US-6013419-A POLYIMIDE RESIN FILMS, COATING ON THE SURFACE WITH CYCLODEHYDRATION AND PHOTOPOLYMERIZATION FUJITSU LIMITED (JP) 2000-01-11 US disclosed
US-5972807-A A POLYMERIC COMPOSITE HAVING PARTICLES-IN-MATRIX MICROSTRUCTURE INCLUDING A MATRIX OF POLYIMIDE CONTAINING POLYHYDRIC POLYAMINE, AROMATIC DIAMINE, AND TETRACARBOXYLIC ACID; PHOTOCURED PHOSPHAZENIC OR ACRYLIC POLYMER PARTICLES FUJITSU LIMITED (JP) 1999-10-26 US disclosed
EP-0453237-B1 Photosensitive, heat-resistant resin composition and pattern formation process FUJITSU LTD (JP) 1998-12-09 EP disclosed
EP-0453237-A2 Photosensitive, heat-resistant resin composition and pattern formation process FUJITSU LIMITED (JP) 1991-10-23 EP disclosed