SCHEMBL581465

SCHEMBL581465

CCC(=O)c1cccc(C)c1C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.46
ESR2 Q92731 1/20 0.46
KMT2A Q03164 3/20 0.44
HSD17B10 Q99714 2/20 0.44
KDM4E B2RXH2 1/20 0.44
ALDH1A1 P00352 1/20 0.44
HPGD P15428 1/20 0.44
MEN1 O00255 2/20 0.43
CYP3A4 P08684 2/20 0.43
TRPA1 O75762 2/20 0.43
LMNA P02545 2/20 0.43
AKR1B10 O60218 1/20 0.43
ABCB11 O95342 1/20 0.43
DHFR P00374 1/20 0.43
MPO P05164 1/20 0.43
CYP1A2 P05177 1/20 0.43
CHRM1 P11229 1/20 0.43
CYP2C9 P11712 1/20 0.43
AKR1B1 P15121 1/20 0.43
PTGS1 P23219 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30578286 1.00 ESR1 (0.46) ESR1ESR2KMT2AHSD17B10KDM4E
SCHEMBL5309095 0.84 CTNNB1 (0.46) ESR1ESR2KMT2AHSD17B10ALDH1A1
SCHEMBL10770139 0.83 ESR1 (0.46) ESR1ESR2KMT2AHSD17B10KDM4E
SCHEMBL364889 0.83 ERCC5 (0.60) KMT2AALDH1A1HPGDMEN1ERCC5
SCHEMBL31901342 0.83 ERCC5 (0.60) KMT2AALDH1A1HPGDMEN1ERCC5
SCHEMBL4116876 0.82 ALDH1A1 (0.62) KMT2AHSD17B10KDM4EALDH1A1HPGD
SCHEMBL671234 0.82 HSP90AB1 (0.48) KMT2AHSD17B10KDM4EALDH1A1HPGD
SCHEMBL8744698 0.82 ESR1 (0.45) ESR1ESR2KMT2AHSD17B10KDM4E
SCHEMBL28391695 0.82 ESR1 (0.45) ESR1ESR2KMT2AHSD17B10KDM4E
SCHEMBL7450427 0.81 HSP90AB1 (0.47) KMT2AHSD17B10KDM4EALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1028535-C Photosensitive thermosetting resin composition TAIYO INK MFG CO LTD (JP) 1995-05-24 CN claimed
CN-1033389-A Photosensitive thermosetting resin composition and method for forming solder resist pattern using the same TAIYO INK MFG CO LTD (JP) 1989-06-14 CN claimed
US-12522696-B2 Bisphenol composition and polycarbonate resin MITSUBISHI CHEMICAL CORPORATION (JP) 2026-01-13 US disclosed
US-12215189-B2 Bisphenol composition and polycarbonate resin MITSUBISHI CHEMICAL CORPORATION (JP) 2025-02-04 US disclosed
CN-113574041-B Bisphenol production method and polycarbonate resin production method 三菱化学株式会社 2023-10-13 CN disclosed
CN-113574042-B Bisphenol composition and polycarbonate resin 三菱化学株式会社 2023-10-13 CN disclosed
WO-2023115621-A1 METHOD FOR PREPARING Α-HALOGENATED ACETOPHENONE COMPOUND UNDER CATALYSIS OF IONIC LIQUID [TEA][TFOH]2 大连大学 2023-06-29 WO disclosed
US-20230192722-A1 SALTS AND SOLID FORMS OF AN FGFR INHIBITOR AND PROCESSES OF PREPARING THEREOF INCYTE CORPORATION 2023-06-22 US disclosed
US-11427523-B2 Bisphenol composition containing aromatic alcohol sulfonate and method for producing same, polycarbonate resin and method for producing same, and bisphenol production method MITSUBISHI CHEMICAL CORPORATION (JP) 2022-08-30 US disclosed
US-11359136-B2 Colorimetric indicators for photocurable sealants THE BOEING COMPANY (US) 2022-06-14 US disclosed
CN-113308705-B Electrooxidation preparation method of kresoxim-methyl and trifloxystrobin intermediate 湖南大学 2022-04-08 CN disclosed
CN-1464996-A resist curable resin composition and cured product thereof SHOWA DENKO KK (JP) 2003-12-31 CN disclosed
EP-0980369-A1 SULFONAMIDES FOR TREATMENT OF ENDOTHELIN-MEDIATED DISORDERS TEXAS BIOTECHNOLOGY CORPORATION (US) 2000-02-23 EP disclosed
WO-1998049162-A1 SULFONAMIDES FOR TREATMENT OF ENDOTHELIN-MEDIATED DISORDERS TEXAS BIOTECHNOLOGY CORPORATION (US) 1998-11-05 WO disclosed
CN-1028535-C Photosensitive thermosetting resin composition TAIYO INK MFG CO LTD (JP) 1995-05-24 CN disclosed
US-5103022-A Reacting dl-2-methyl-1-(4-trifluoromethylphenyl)-3-pyrrolidino -1-propanone with l-acetylphenylglycine to form corresponding diastereomeric salt, deposition, isolation of l-2-methyl-1-(4-trifluoromethylphenyl)-3-pyrrolidino-1-propanone NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1992-04-07 US disclosed
US-5057535-A Muscle relaxants NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1991-10-15 US disclosed
CN-1033389-A Photosensitive thermosetting resin composition and method for forming solder resist pattern using the same TAIYO INK MFG CO LTD (JP) 1989-06-14 CN disclosed
EP-0200942-A2 New derivatives of an aminoketone NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1986-11-12 EP disclosed
US-4071540-A MALEIC OR PHTHALIC CHEVRON RESEARCH COMPANY (US) 1978-01-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12215189-B2 Bisphenol composition and polycarbonate resin SUZ12, RB1, RRP12 ESR1 71/4885ESR2 36/4885KMT2A 1192/4885
US-20230192722-A1 SALTS AND SOLID FORMS OF AN FGFR INHIBITOR AND PROCESSES OF PREPARING THEREOF FGFR1, FGFR3, FGFR4 ESR1 1290/4885ESR2 2158/4885KMT2A 595/4885
US-11427523-B2 Bisphenol composition containing aromatic alcohol sulfonate and method for producing same, polycarbonate resin and method for producing same, and bisphenol production method ASH2L, FHIT, ADH1C ESR1 690/4885ESR2 1124/4885KMT2A 625/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.