SCHEMBL411867

SCHEMBL411867

C=Cc1cccc(OC2CCCCO2)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DHFR P00374 1/20 0.46
HSD11B1 P28845 1/20 0.40
KDM4C Q9H3R0 1/20 0.36
TP53 P04637 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
PTPN1 P18031 2/20 0.34
NPC1 O15118 2/20 0.32
RAB9A P51151 2/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
CASP3 P42574 1/20 0.32
SENP8 Q96LD8 1/20 0.32
SENP7 Q9BQF6 1/20 0.32
SENP6 Q9GZR1 1/20 0.32
TNK2 Q07912 1/20 0.32
PDE4B Q07343 1/20 0.32
TLR4 O00206 1/20 0.32
TLR2 O60603 1/20 0.32
ALDH1A1 P00352 2/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5942305 0.96 DHFR (0.41) DHFRHSD11B1KDM4CTP53TDP1
SCHEMBL29646493 0.86 DHFR (0.46) DHFRHSD11B1KDM4CTDP1NPC1
SCHEMBL2204157 0.86 DHFR (0.46) DHFRHSD11B1KDM4CTDP1NPC1
SCHEMBL2768829 0.85 DHFR (0.36) DHFRHSD11B1KDM4CPTPN1NPC1
SCHEMBL3184997 0.85 DHFR (0.53) DHFRHSD11B1KDM4CTP53NPC1
SCHEMBL412542 0.82 ALDH1A1 (0.39) DHFRHSD11B1KDM4CPTPN1NPC1
SCHEMBL25203812 0.81 CCNB2 (0.44) DHFRHSD11B1KDM4CPTPN1NPC1
SCHEMBL5546439 0.81 DHFR (0.48) DHFRHSD11B1KDM4CPTPN1NPC1
SCHEMBL8527580 0.80 PDE4B (0.34) DHFRPTPN1PDE4B
SCHEMBL15496944 0.79 HDAC4 (0.41) TP53TDP1NPC1RAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025048577-A1 METHOD FOR MANUFACTURING FUNCTIONAL POLYMERS BY ANIONIC POLYMERIZATION 주식회사 이엔에프테크놀로지 2025-03-06 WO disclosed
US-12180322-B2 Protein adsorption preventing agent, protein adsorption preventing film, and medical tool using same MARUZEN PETROCHEMICAL CO., LTD. (JP) 2024-12-31 US disclosed
EP-3647389-B1 PROTEIN ADSORPTION PREVENTING AGENT, PROTEIN ADSORPTION PREVENTING FILM, AND MEDICAL TOOL USING SAME MARUZEN PETROCHEM CO LTD (JP) 2023-05-10 EP disclosed
US-20210122867-A1 PROTEIN ADSORPTION PREVENTING AGENT, PROTEIN ADSORPTION PREVENTING FILM, AND MEDICAL TOOL USING SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2021-04-29 US disclosed
CN-107849167-B Method for producing polymer for electronic material and polymer for electronic material obtained by the production method 丸善石油化学株式会社 2021-02-23 CN disclosed
US-10913873-B2 Block copolymers with high flory-huggins interaction parameters for block copolymer lithography WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2021-02-09 US disclosed
US-10766973-B2 Method for producing polymer for electronic material and polymer for electronic material obtained by the production method MARUZEN PETROCHEMICAL CO., LTD. (JP) 2020-09-08 US disclosed
EP-3647389-A1 PROTEIN ADSORPTION PREVENTING AGENT, PROTEIN ADSORPTION PREVENTING FILM, AND MEDICAL TOOL USING SAME Maruzen Petrochemical Co., Ltd. (JP) 2020-05-06 EP disclosed
CN-111065454-A Protein-resistant adsorbent, protein-resistant film, and medical device using same 丸善石油化学株式会社 2020-04-24 CN disclosed
US-20200040119-A1 BLOCK COPOLYMER AND PREPARATION METHOD AND APPLICATION THEREOF FUDAN UNIVERSITY (CN) 2020-02-06 US disclosed
EP-2412737-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF Maruzen Petrochemical CO., LTD. (JP) 2012-02-01 EP disclosed
US-20120022219-A1 VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF MARUZEN PETROCHEMICAL CO., LTD 2012-01-26 US disclosed
US-20100286351-A1 ABA TRIBLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-11-11 US disclosed
EP-2186837-A1 ABA TRIBLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-05-19 EP disclosed
US-20060073411-A1 Chemically amplified resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-04-06 US disclosed
US-20040191674-A1 Chemical amplification resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-09-30 US disclosed
US-6656660-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US disclosed
EP-1024406-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 2000-08-02 EP disclosed
US-5350660-A Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1994-09-27 US disclosed
EP-0440374-A2 Chemical amplified resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1991-08-07 EP disclosed