SCHEMBL4124215

SCHEMBL4124215

CO[Zr](OC)(C1=C(C)C=CC1)C1=C(C)C=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1135096 0.80
SCHEMBL3815750 0.80
SCHEMBL1135065 0.73
SCHEMBL1135088 0.73
SCHEMBL796734 0.71
SCHEMBL4430872 0.71
SCHEMBL5499543 0.70
SCHEMBL16667144 0.70
SCHEMBL4376086 0.68
Hydrochloric Acid SCHEMBL17698538 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1948841-B1 CYCLOPENTADIENYL TYPE HAFNIUM AND ZIRCONIUM PRECURSORS AND USE THEREOF IN ATOMIC LAYER DEPOSITION SIGMA ALDRICH CO LLC (US) 2015-04-29 EP claimed
US-20090035946-A1 IN SITU DEPOSITION OF DIFFERENT METAL-CONTAINING FILMS USING CYCLOPENTADIENYL METAL PRECURSORS ASM INTERNATIONAL N.V. 2009-02-05 US claimed
EP-1948841-A1 CYCLOPENTADIENYL TYPE HAFNIUM AND ZIRCONIUM PRECURSORS AND USE THEREOF IN ATOMIC LAYER DEPOSITION Sigma-Aldrich Co. (US) 2008-07-30 EP claimed
WO-2006131751-A1 CYCLOPENTADIENYL TYPE HAFNIUM AND ZIRCONIUM PRECURSORS AND USE THEREOF IN ATOMIC LAYER DEPOSITION SIGMA-ALDRICH CO. (US) 2006-12-14 WO claimed
US-20090035946-A1 IN SITU DEPOSITION OF DIFFERENT METAL-CONTAINING FILMS USING CYCLOPENTADIENYL METAL PRECURSORS ASM INTERNATIONAL N.V. 2009-02-05 US disclosed