⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4430872 | 0.85 | — | — | |
| SCHEMBL1135088 | 0.77 | — | — | |
| SCHEMBL1135065 | 0.77 | — | — | |
| SCHEMBL4376086 | 0.76 | — | — | |
| SCHEMBL6857146 | 0.71 | — | — | |
| SCHEMBL4124215 | 0.71 | — | — | |
| SCHEMBL10921505 | 0.71 | — | — | |
| SCHEMBL872234 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL17698538 | 0.71 | — | — | |
| SCHEMBL27737190 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-12393116-B2 | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | FUJIFILM CORPORATION (JP) | 2025-08-19 | — | — | US | disclosed |
| EP-3893053-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, MULTILAYER BODY AND DEVICE | FUJIFILM CORP (JP) | 2025-01-22 | — | — | EP | disclosed |
| US-12078929-B2 | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | FUJIFILM CORPORATION (JP) | 2024-09-03 | — | — | US | disclosed |
| EP-3893053-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, MULTILAYER BODY AND DEVICE | FUJIFILM Corporation (JP) | 2021-10-13 | — | — | EP | disclosed |
| EP-3893054-A1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM Corporation (JP) | 2021-10-13 | — | — | EP | disclosed |
| US-20210302835-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORPORATION (JP) | 2021-09-30 | — | — | US | disclosed |
| US-20210302836-A1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORPORATION (JP) | 2021-09-30 | — | — | US | disclosed |
| EP-3492982-B1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| EP-3492982-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2019-06-05 | — | — | EP | disclosed |
| US-5418276-A | Styrene copolymer, syndiotactic, heat resistance, chemical resistance | IDEMITSU KOSAN CO., LTD. (JP) | 1995-05-23 | — | — | US | disclosed |
| US-5418290-A | Compatability with other resins, adhesion | IDEMITSU KOSAN CO., LTD. (JP) | 1995-05-23 | — | — | US | disclosed |
| US-5391626-A | Syndiotactic, high performance, compatibility and adhesiveness; molding materials | IDEMITSU KOSAN CO., LTD. (JP) | 1995-02-21 | — | — | US | disclosed |
| US-5369196-A | Production process of olefin based polymers | IDEMITSU KOSAN CO., LTD. (JP) | 1994-11-29 | — | — | US | disclosed |
| US-5362814-A | Styrene polymers with olefin monomers and diolefin monomers for impact strength in molding materials | IDEMITSU KOSAN CO., LTD. (JP) | 1994-11-08 | — | — | US | disclosed |
| EP-0570931-A2 | Styrenic polymer, process for producing same and multi-layer material comprising same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1993-11-24 | — | — | EP | disclosed |
| EP-0570932-A2 | Styrenic block copolymer and process for producing same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1993-11-24 | — | — | EP | disclosed |
| EP-0559108-A1 | Graft copolymer, process for production thereof and resin composition containing same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1993-09-08 | — | — | EP | disclosed |
| EP-0513380-A1 | PROCESS FOR PRODUCING OLEFINIC POLYMER | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-11-19 | — | — | EP | disclosed |
| EP-0504418-A1 | PROCESS FOR PRODUCING CYCLOOLEFIN POLYMER, CYCLOOLEFIN COPOLYMER, AND COMPOSITION AND MOLDING PREPARED THEREFROM | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-23 | — | — | EP | disclosed |