Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.68 |
| ▸ | F2 | P00734 | 2/20 | 0.66 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.66 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.66 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.66 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.63 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.61 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.61 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.61 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.61 |
| ▸ | MEN1 | O00255 | 2/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.59 |
| ▸ | GAA | P10253 | 1/20 | 0.55 |
| ▸ | PKM | P14618 | 1/20 | 0.55 |
| ▸ | CA1 | P00915 | 5/20 | 0.53 |
| ▸ | CA2 | P00918 | 5/20 | 0.53 |
| ▸ | CA5A | P35218 | 5/20 | 0.53 |
| ▸ | CA5B | Q9Y2D0 | 5/20 | 0.53 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28550247 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL26058 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL30481552 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL106811 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL60288 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL7423952 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL585645 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL17024352 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL17419427 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 | |
| SCHEMBL30233530 | 1.00 | KMT2A (0.68) | KMT2AF2PRSS1PRSS2PRSS3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3558954-A1 | IMPROVED PROCESS FOR THE MANUFACTURE OF R-6-HYDROXY-8-[1-HYDROXY-2-[2-(4-METHOXYPHENYL)-1,1-DIMETHYLETHYLAMINOETHYL]-2H-1,4-BENZOXAZIN-3(4H)-ONE HYDROCHLORIDE | INKE, S.A. (ES) | 2019-10-30 | — | — | EP | disclosed |
| WO-2018114887-A1 | IMPROVED PROCESS FOR THE MANUFACTURE OF R-6-HYDROXY-8-[1-HYDROXY-2-[2-(4-METHOXYPHENYL)-1,1-DIMETHYLETHYLAMINOETHYL]-2H-1,4-BENZOXAZIN-3(4H)-ONE HYDROCHLORIDE | LABORATORIOS LESVI, S.L. (ES) | 2018-06-28 | — | — | WO | disclosed |
| EP-3168207-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-05-17 | — | — | EP | disclosed |
| EP-2579098-B1 | Method of forming patterns | FUJIFILM CORP (JP) | 2017-04-05 | — | — | EP | disclosed |
| EP-1903394-B1 | Resist composition, resin for use in the resist composition, and pattern-forming method using the resist composition | FUJIFILM CORP (JP) | 2015-04-29 | — | — | EP | disclosed |
| EP-2413195-B1 | Pattern forming method | FUJIFILM CORP (JP) | 2013-08-28 | — | — | EP | disclosed |
| EP-2579098-A1 | Method of forming patterns | Fujifilm Corporation (JP) | 2013-04-10 | — | — | EP | disclosed |
| US-20120065226-A1 | SALTS OF TIOTROPIUM WITH 10-CAMPHORSULFONIC ACID | ADAMED SP Z O.O. (PL) | 2012-03-15 | — | — | US | disclosed |
| EP-2417101-A1 | INDANE DERIVATIVES | MSD Oss B.V. (NL) | 2012-02-15 | — | — | EP | disclosed |
| EP-2297110-A1 | INDANE DERIVATIVES AS AMPA RECEPTOR MODULATORS | N.V. Organon (NL) | 2011-03-23 | — | — | EP | disclosed |
| WO-2009147167-A1 | INDANE DERIVATIVES AS AMPA RECEPTOR MODULATORS | N.V. ORGANON (NL) | 2009-12-10 | — | — | WO | disclosed |
| EP-2034361-A2 | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition | Fujifilm Corporation (JP) | 2009-03-11 | — | — | EP | disclosed |
| EP-2031445-A2 | Chemical amplification resist composition and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2009-03-04 | — | — | EP | disclosed |
| EP-2020616-A2 | Resist composition for electron beam, x-ray, or euv, and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2009-02-04 | — | — | EP | disclosed |
| EP-1767993-B1 | Positive photosensitive composition and pattern forming method using the same | FUJIFILM CORP (JP) | 2008-12-24 | — | — | EP | disclosed |
| EP-1975713-A2 | Positive resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-10-01 | — | — | EP | disclosed |
| US-7429679-B2 | Sulphonic acid salt of sibutramine | CJ CORPORATION (KR) | 2008-09-30 | — | — | US | disclosed |
| EP-1906247-A1 | Resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |
| US-20070191481-A1 | Sulphonic acid salt of sibutramine | CJ CORPORATION (KR) | 2007-08-16 | — | — | US | disclosed |
| CN-1867330-A | N-substituted azacycles | FMC CORP (US) | 2006-11-22 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070191481-A1 | Sulphonic acid salt of sibutramine | GPR119, FABP6, HTR6 | KMT2A 2358/4885F2 4773/4885PRSS1 185/4885 |
| US-20120065226-A1 | SALTS OF TIOTROPIUM WITH 10-CAMPHORSULFONIC ACID | PDE10A, PDE6A, PDE6H | KMT2A 4564/4885F2 4236/4885PRSS1 435/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.