SCHEMBL412663

SCHEMBL412663

CC(Cc1ccccc1)OC(C)Cc1ccccc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 7/20 0.58
TAAR1 Q96RJ0 5/20 0.58
SLC6A2 P23975 3/20 0.58
SLC6A4 P31645 2/20 0.58
SLC6A3 Q01959 2/20 0.58
MAOA P21397 1/20 0.58
CYP2A6 P11509 1/20 0.58
ADORA2A P29274 1/20 0.58
ADORA1 P30542 1/20 0.58
SLC18A2 Q05940 1/20 0.54
CYP2D6 P10635 1/20 0.54
TRPA1 O75762 2/20 0.52
EPHX1 P07099 1/20 0.50
ADRA2B P18089 1/20 0.48
ADRA2C P18825 1/20 0.48
HTR2A P28223 1/20 0.48
ADRA1A P35348 1/20 0.48
OPRK1 P41145 1/20 0.48
KCNH2 Q12809 1/20 0.48
MEN1 O00255 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14667578 0.91 TRPA1 (0.52) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL14667580 0.90 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Ether SCHEMBL9741321 0.89 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL14667581 0.84 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL14667577 0.84 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL1256615 0.84 SIGMAR1 (0.58) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Biphenyl SCHEMBL5805060 0.84 SIGMAR1 (0.47) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL10377275 0.83 SIGMAR1 (0.47) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL13189946 0.82 SIGMAR1 (0.56) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL13006663 0.82 SIGMAR1 (0.56) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3780 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250383601-A1 ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE IRRESISTIBLE MATERIALS LTD (GB) 2025-12-18 US claimed
US-20250325463-A1 COMPOSITIONS (III) SYMRISE AG (DE) 2025-10-23 US claimed
EP-4602141-A1 A FRAGRANCE MIXTURE (VI) Symrise AG (DE) 2025-08-20 EP claimed
EP-4532646-A1 A FRAGRANCE MIXTURE (V) Symrise AG (DE) 2025-04-09 EP claimed
US-20250099349-A1 A FRAGRANCE MIXTURE SYMRISE AG (DE) 2025-03-27 US claimed
EP-4519403-A1 A FRAGRANCE MIXTURE (V) Symrise AG (DE) 2025-03-12 EP claimed
EP-4472606-A1 COMPOSITIONS (III) Symrise AG (DE) 2024-12-11 EP claimed
EP-4473079-A1 A FRAGRANCE MIXTURE Symrise AG (DE) 2024-12-11 EP claimed
US-20240358611-A1 COMPOSITIONS SYMRISE AG (DE) 2024-10-31 US claimed
EP-4429465-A1 COMPOSITIONS COMPRISING TRPM8 AGONISTIC COOLING AGENTS Symrise AG (DE) 2024-09-18 EP claimed
US-20130261160-A1 METHOD OF PREPARATION OF METAXALONE AZIENDE CHIMICHE RIUNITE ANGELINI FRANCESCO A.C.R.A.F. S.P.A. (IT) 2013-10-03 US claimed
WO-2012104139-A1 METHOD OF PREPARATION OF METAXALONE AZIENDE CHIMICHE RIUNITE ANGELINI FRANCESCO A.C.R.A.F. S.P.A. (IT) 2012-08-09 WO claimed
EP-1693405-B1 PROTON CONDUCTING MEMBRANE AND PROCESS FOR PRODUCING THE SAME JSR CORP (JP) 2012-05-02 EP claimed
US-20090137557-A1 Calcilytic Compounds SMITHKLINE BEECHAM CORPORATION 2009-05-28 US claimed
US-7524583-B2 Non-aqueous electrolytic secondary battery SANYO ELECTRIC CO., LTD. (JP) 2009-04-28 US claimed
EP-1951244-A2 CALCILYTIC COMPOUNDS SmithKline Beecham Corporation (US) 2008-08-06 EP claimed
WO-2007062370-A2 CALCILYTIC COMPOUNDS SMITHKLINE BEECHAM CORPORATION (US) 2007-05-31 WO claimed
US-20050019655-A1 An anode of sulfur as active material and ionic liquid electrolyte, e.g. trimethylpropylammonium bistrifluoromethylsulfonimide and lithium bistrifluoromethylsulfonimide; high energy density for portable electronics SANYO ELECTRIC CO., LTD. (JP) 2005-01-27 US claimed
US-5391460-A Resin composition and process for investment casting using stereolithography HUGHES AIRCRAFT COMPANY (US) 1995-02-21 US claimed
EP-0211667-B1 RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-03-11 EP claimed