Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 2/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | TP53 | P04637 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | PTGER1 | P34995 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4131408 | 0.85 | ALDH1A1 (0.40) | TSHRSMN1; SMN2ALDH1A1CYP3A4ESR1 | |
| SCHEMBL27589924 | 0.84 | GABRA1 (0.38) | GABRA1GABRB2TSHRNLRP3SMN1; SMN2 | |
| SCHEMBL7569500 | 0.78 | GABRA1 (0.37) | GABRA1GABRB2SMN1; SMN2 | |
| SCHEMBL28776561 | 0.77 | CLCN2 (0.44) | GABRA1GABRB2ALDH1A1TDP1KDM4E | |
| SCHEMBL8166933 | 0.77 | GABRA1 (0.44) | GABRA1GABRB2TSHRNLRP3SMN1; SMN2 | |
| SCHEMBL13344106 | 0.75 | GABRA1 (0.43) | GABRA1GABRB2TSHRNLRP3SMN1; SMN2 | |
| SCHEMBL4130567 | 0.74 | MEN1 (0.37) | GABRA1GABRB2TDP1ESR1MEN1 | |
| SCHEMBL16954557 | 0.73 | MAPT (0.44) | GABRA1GABRB2TSHRNLRP3ALDH1A1 | |
| SCHEMBL982695 | 0.73 | TSHR (0.50) | GABRA1GABRB2TSHRNLRP3SMN1; SMN2 | |
| SCHEMBL4131775 | 0.72 | FGFR1 (0.40) | SMN1; SMN2ALDH1A1TDP1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12100809-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-09-24 | — | — | US | disclosed |
| US-20220149436-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| US-11283107-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-03-22 | — | — | US | disclosed |
| EP-3621141-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2020-03-11 | — | — | EP | disclosed |
| US-20190229372-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-07-25 | — | — | US | disclosed |
| US-10333172-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-06-25 | — | — | US | disclosed |
| US-10290901-B2 | — | — | 2019-05-14 | — | — | US | disclosed |
| US-20170084955-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-03-23 | — | — | US | disclosed |
| US-20150072525-A1 | POLISHING LIQUID AND POLISHING METHOD | FUJIFILM CORPORATION (JP) | 2015-03-12 | — | — | US | disclosed |
| US-20150056503-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2015-02-26 | — | — | US | disclosed |
| US-8911643-B2 | Polishing liquid and polishing method | FUJIFILM CORPORATION (JP) | 2014-12-16 | — | — | US | disclosed |
| US-8409467-B2 | Polishing liquid for semiconductor integrated circuit | FUJIFILM CORPORATION (JP) | 2013-04-02 | — | — | US | disclosed |
| US-8404146-B2 | Polishing liquid and polishing method | FUJIFILM CORPORATION (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20090298290-A1 | Polishing liquid and polishing method | FUJIFILM CORPORATION (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090215270-A1 | Polishing liquid and polishing method | FUJIFILM CORPORATION (JP) | 2009-08-27 | — | — | US | disclosed |
| EP-2012386-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | Mitsubishi Chemical Corporation (JP) | 2009-01-07 | — | — | EP | disclosed |