SCHEMBL4132657

SCHEMBL4132657

C1CCN(c2nc(NCCNc3nc(N4CCCCC4)nc(N4CCCCC4)n3)nc(N3CCCCC3)n2)CC1

nearest known ligand 0.76

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 6/20 0.76
MEN1 O00255 4/20 0.76
KMT2A Q03164 4/20 0.76
GBA1 P04062 4/20 0.55
POLB P06746 2/20 0.55
NPSR1 Q6W5P4 4/20 0.54
SMN1; SMN2 Q16637 2/20 0.54
ALOX15 P16050 1/20 0.54
TSHR P16473 1/20 0.54
CRHBP P24387 1/20 0.54
CRHR2 Q13324 1/20 0.54
ALDH1A1 P00352 1/20 0.53
CYP1A2 P05177 1/20 0.53
CYP2D6 P10635 1/20 0.53
CYP2C9 P11712 1/20 0.53
CYP2C19 P33261 1/20 0.53
SLC29A1 Q99808 3/20 0.50
USP2 O75604 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
MAPT P10636 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28769756 0.89 LMNA (0.67) LMNAMEN1KMT2AGBA1POLB
SCHEMBL8052164 0.85 GBA1 (0.75) LMNAMEN1KMT2AGBA1POLB
SCHEMBL8422579 0.84 LMNA (0.61) LMNAMEN1KMT2AGBA1POLB
SCHEMBL7774642 0.82 LMNA (0.73) LMNAMEN1KMT2AGBA1POLB
SCHEMBL21325617 0.82 LMNA (0.63) LMNAMEN1KMT2AGBA1POLB
SCHEMBL14503351 0.81 LMNA (0.62) LMNAMEN1KMT2ATSHRALDH1A1
SCHEMBL8611070 0.80 MEN1 (0.79) LMNAMEN1KMT2AGBA1POLB
SCHEMBL8885835 0.80 TSHR (0.69) LMNAMEN1KMT2AGBA1SMN1; SMN2
SCHEMBL9913727 0.80 LMNA (0.75) LMNAMEN1KMT2AGBA1POLB
SCHEMBL778367 0.80 TSHR (0.59) LMNAMEN1KMT2AGBA1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5606055-A ALKYLENEBISMELAMINE DERIVATIVE HAKKOL CHEMICAL CO., LTD. (JP) 1997-02-25 US claimed
US-20090092766-A1 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-04-09 US disclosed
WO-2006123834-A2 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2006-11-23 WO disclosed