SCHEMBL4135826

SCHEMBL4135826

O=C(O)CCc1nnnn1CC(=O)O

nearest known ligand 0.54

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
KDM4C Q9H3R0 1/20 0.53
ALDH1A1 P00352 2/20 0.44
HPGD P15428 1/20 0.44
NAALAD2 Q9Y3Q0 2/20 0.40
HSD11B1 P28845 6/20 0.38
MAPK1 P28482 1/20 0.38
HDAC6 Q9UBN7 2/20 0.36
TRPV1 Q8NER1 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9602466 0.85 KDM4C (0.53) KDM4CALDH1A1HPGDNAALAD2HSD11B1
SCHEMBL9602462 0.85 KDM4C (0.53) KDM4CALDH1A1HPGDNAALAD2HSD11B1
SCHEMBL28695451 0.84 KDM4C (0.51) KDM4CALDH1A1HPGDNAALAD2MAPK1
SCHEMBL28692281 0.84 NAALAD2 (0.42) KDM4CALDH1A1NAALAD2HSD11B1MAPK1
SCHEMBL11535261 0.84 KDM4C (0.51) KDM4CALDH1A1HPGDNAALAD2HSD11B1
SCHEMBL13872406 0.81 KDM4C (0.55) KDM4CALDH1A1HPGDNAALAD2HSD11B1
SCHEMBL3728791 0.81 KDM4C (0.55) KDM4CALDH1A1HPGDNAALAD2MAPK1
SCHEMBL28691023 0.81 NAALAD2 (0.43) KDM4CALDH1A1NAALAD2MAPK1HDAC6
SCHEMBL11802408 0.80 KDM4C (0.48) KDM4CALDH1A1HPGDMAPK1
SCHEMBL20223332 0.79 KDM4C (0.54) KDM4CALDH1A1HPGDMAPK1TRPV1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090087988-A1 POLISHING LIQUID AND POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090087988-A1 POLISHING LIQUID AND POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090087988-A1 POLISHING LIQUID AND POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
CN-101397480-A Polishing liquid and polishing method FUJIFILM CORP (JP) 2009-04-01 CN disclosed