SCHEMBL4138210

SCHEMBL4138210

CN(C)c1nc(N(C)C)nc(N(CCN)c2nc(N(C)C)nc(N(C)C)n2)n1

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.52
CYP1A2 P05177 1/20 0.52
THRB P10828 1/20 0.52
BLM P54132 1/20 0.52
CREBBP Q92793 1/20 0.52
HSD17B10 Q99714 1/20 0.52
ALDH1A1 P00352 5/20 0.41
KDM4E B2RXH2 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
CA1 P00915 3/20 0.34
CA2 P00918 3/20 0.34
CA9 Q16790 3/20 0.34
POLB P06746 1/20 0.33
HTT P42858 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Altretamine SCHEMBL2354769 0.72 LMNA (1.00) LMNACYP1A2THRBBLMCREBBP
Altretamine SCHEMBL4206 0.72 LMNA (1.00) LMNACYP1A2THRBBLMCREBBP
SCHEMBL11686746 0.71 LMNA (0.41) LMNACYP1A2THRBBLMCREBBP
Altretamine SCHEMBL28244776 0.69 LMNA (0.92) LMNACYP1A2THRBBLMCREBBP
Altretamine SCHEMBL11746235 0.69 LMNA (0.92) LMNACYP1A2THRBBLMCREBBP
Altretamine SCHEMBL29131538 0.69 LMNA (0.92) LMNACYP1A2THRBBLMCREBBP
Altretamine SCHEMBL10481678 0.69 LMNA (0.92) LMNACYP1A2THRBBLMCREBBP
SCHEMBL4151814 0.69 LMNA (0.65) LMNACYP1A2THRBBLMCREBBP
SCHEMBL27460191 0.67 HRH3 (0.46) LMNACYP1A2THRBBLMCREBBP
Altretamine SCHEMBL20770606 0.67 LMNA (0.85) LMNACYP1A2THRBBLMCREBBP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090092766-A1 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-04-09 US disclosed
WO-2006123834-A2 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2006-11-23 WO disclosed