Known targets — ChEMBL curated mechanism
CACNA1CCACNA1DCACNA1FCACNA1SDRD2HTR1BHTR1DHTR1F
The experimentally established mechanism targets of Malic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.79 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | TET2 | Q6N021 | 6/20 | 0.46 |
| ▸ | TET3 | O43151 | 2/20 | 0.46 |
| ▸ | TET1 | Q8NFU7 | 1/20 | 0.46 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.46 |
| ▸ | KDM4A | O75164 | 2/20 | 0.44 |
| ▸ | KDM4C | Q9H3R0 | 2/20 | 0.44 |
| ▸ | KDM2A | Q9Y2K7 | 2/20 | 0.44 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Malic Acid SCHEMBL18981018 | 0.92 | SMN1; SMN2 (0.94) | SMN1; SMN2MAPTTET2TET3TET1 | |
| Malic Acid SCHEMBL10573554 | 0.92 | SMN1; SMN2 (0.94) | SMN1; SMN2MAPTTET2TET3TET1 | |
| Malic Acid SCHEMBL27579591 | 0.89 | SMN1; SMN2 (0.88) | SMN1; SMN2MAPTTET2TET3TET1 | |
| Malic Acid SCHEMBL9782806 | 0.89 | SMN1; SMN2 (0.88) | SMN1; SMN2MAPTTET2TET3TET1 | |
| Malic Acid SCHEMBL27536502 | 0.89 | SMN1; SMN2 (0.88) | SMN1; SMN2MAPTTET2TET3TET1 | |
| Malic Acid SCHEMBL98496 | 0.89 | — | — | |
| Malic Acid SCHEMBL856 | 0.89 | — | — | |
| Malic Acid SCHEMBL31673489 | 0.89 | — | — | |
| Malic Acid SCHEMBL89131 | 0.89 | SMN1; SMN2 (1.00) | SMN1; SMN2TET2TET3TET1SLC22A6 | |
| Malic Acid SCHEMBL31673494 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140193975-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-10 | — | — | US | disclosed |
| EP-2657240-A1 | Silicon compound, silicon-containing compound, composition for forming resits underlayer film containing the same and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| US-20130280912-A1 | SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING THE SAME AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-24 | — | — | US | disclosed |
| US-20130059439-A1 | CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONIC COMPONENT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-03-07 | — | — | US | disclosed |
| US-20120299158-A1 | CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONIC COMPONENT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-11-29 | — | — | US | disclosed |
| US-20090214796-A1 | Method for Forming Antireflection Film | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-5933693-A | Electroconductive elastic member and electrophotographic apparatus using same | BRIDGESTONE CORPORATION (JP) | 1999-08-03 | — | — | US | disclosed |