Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.54 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.54 |
| ▸ | NPSR1 | Q6W5P4 | 7/20 | 0.49 |
| ▸ | CFTR | P13569 | 1/20 | 0.48 |
| ▸ | GOPC | Q9HD26 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17207358 | 0.89 | CYP1A2 (0.46) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL17207899 | 0.87 | CYP1A2 (0.43) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL21971796 | 0.83 | NPSR1 (0.51) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL414941 | 0.83 | CYP1A2 (0.49) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL415460 | 0.81 | NPSR1 (0.68) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL21971092 | 0.81 | NPSR1 (0.50) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL414309 | 0.81 | NPSR1 (0.52) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL416279 | 0.80 | CYP1A2 (0.53) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL21971124 | 0.78 | NPSR1 (0.50) | CYP1A2CYP2C19NPSR1CFTRGOPC | |
| SCHEMBL22167537 | 0.78 | CYP1A2 (0.44) | CYP1A2CYP2C19NPSR1CFTRGOPC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9045587-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9045587-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140363768-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20140363768-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |