SCHEMBL4151842

SCHEMBL4151842

c1ccc2cc3c(ccc4ncoc43)cc2c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.42
HSD17B10 Q99714 3/20 0.42
HIF1A Q16665 1/20 0.42
CYP1B1 Q16678 1/20 0.42
CYP3A4 P08684 1/20 0.39
NQO2 P16083 1/20 0.38
PI4KA P42356 1/20 0.36
PI4K2B Q8TCG2 1/20 0.36
PI4K2A Q9BTU6 1/20 0.36
PI4KB Q9UBF8 1/20 0.36
ACHE P22303 2/20 0.35
CYP1A2 P05177 2/20 0.35
ERBB2 P04626 1/20 0.35
FYN P06241 1/20 0.35
MAOA P21397 1/20 0.35
AHR P35869 1/20 0.35
MAPT P10636 2/20 0.34
HPGD P15428 2/20 0.34
GLA P06280 1/20 0.34
NPC1 O15118 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29728143 0.83 CYP3A4 (0.52) ALDH1A1HSD17B10HIF1ACYP1B1CYP3A4
SCHEMBL3910922 0.83 CYP3A4 (0.52) ALDH1A1HSD17B10HIF1ACYP1B1CYP3A4
SCHEMBL29141615 0.80 CYP3A4 (0.53) ALDH1A1HSD17B10HIF1ACYP1B1CYP3A4
SCHEMBL31682286 0.80 CYP3A4 (0.53) ALDH1A1HSD17B10HIF1ACYP1B1CYP3A4
SCHEMBL6049574 0.80 CYP3A4 (0.53) ALDH1A1HSD17B10HIF1ACYP1B1CYP3A4
SCHEMBL9194510 0.78 ACLY (0.46) PI4KAPI4KBMAPTNPC1RAB9A
SCHEMBL9195385 0.77 BACE1 (0.49) CYP3A4CYP1A2MAPTNPC1RAB9A
SCHEMBL9194861 0.75 NR4A2 (0.40) ALDH1A1ACHEMAPTHPGDSMN1; SMN2
SCHEMBL9191818 0.75 KDM4E (0.46) ALDH1A1HSD17B10NQO2MAPTHPGD
SCHEMBL24587525 0.74 ALDH1A1 (0.45) ALDH1A1HSD17B10CYP3A4MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090092766-A1 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-04-09 US disclosed
WO-2006123834-A2 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2006-11-23 WO disclosed
EP-1061411-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-10-11 EP disclosed
EP-1067430-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-09-13 EP disclosed
US-20050271987-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. 2005-12-08 US disclosed
US-6838231-B2 Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2005-01-04 US disclosed
US-20040166450-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. 2004-08-26 US disclosed
US-6730468-B1 ADSORBED ON SURFACE A SENSITIZING DYE IN MULTIPLE LAYERS FUJI PHOTO FILM CO., LTD. (JP) 2004-05-04 US disclosed
US-6692905-B2 COLOR PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 2004-02-17 US disclosed
US-20030180673-A1 Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. 2003-09-25 US disclosed
US-6610466-B2 Exhibits increased light absorption and light absorption intensity and which has sensitizing dyes adsorbed in multilayer form stably even in the presence of an organic solvent. FUJI PHOTO FILM CO., LTD. (JP) 2003-08-26 US disclosed
US-6582894-B1 Silver haide photographic emulsion and photographic light-sensitive material using same FUJI PHOTO FILM CO., LTD. (JP) 2003-06-24 US disclosed
US-6521401-B1 Spectrally sensitizing with dye that does not have electric charge or forms an inner salt FUJI PHOTO FILM CO., LTD. (JP) 2003-02-18 US disclosed
US-20020177087-A1 Silver halide photographic lightsensitive material FUJIFILM CORPORATION (JP) 2002-11-28 US disclosed
US-6465166-B1 HIGH SPEED SILVER HALIDE PHOTOGRAPHIC EMULSION WHEREIN THE GRAIN AGGLOMERATION IS PREVENTED AND PHOTOGRAPHIC MATERIAL REDUCED IN RESIDUAL DYE COLOR AFTER PROCESSING FUJI PHOTO FILM. CO., LTD. (JP) 2002-10-15 US disclosed
US-20020012892-A1 Methine compound-containing silver halide photographic emulsion and photographic material using the same FUJIFILM CORPORATION (JP) 2002-01-31 US disclosed
EP-1067430-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2001-01-10 EP disclosed
EP-1061411-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2000-12-20 EP disclosed