SCHEMBL415762

SCHEMBL415762

CCN(c1ccccc1)C(C)O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.45
ALDH1A1 P00352 2/20 0.45
GLA P06280 1/20 0.45
POLB P06746 1/20 0.43
APOBEC3A P31941 1/20 0.43
APOBEC3G Q9HC16 1/20 0.43
LMNA P02545 3/20 0.41
TP53 P04637 2/20 0.41
MAPT P10636 1/20 0.41
PGR P06401 1/20 0.40
ADRA2A P08913 1/20 0.40
ADRA2B P18089 1/20 0.40
HTR2A P28223 1/20 0.40
HRH1 P35367 1/20 0.40
KCNH2 Q12809 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.39
NR1H2 P55055 4/20 0.39
NR1H3 Q13133 4/20 0.39
TRPA1 O75762 1/20 0.38
MEN1 O00255 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL11299546 0.98 TSHR (0.44) TSHRALDH1A1GLAPOLBAPOBEC3A
Sulfuric Acid SCHEMBL9329973 0.91 TP53 (0.46) TSHRALDH1A1GLAPOLBAPOBEC3A
SCHEMBL26088406 0.84 TSHR (0.47) TSHRALDH1A1GLALMNATP53
SCHEMBL11335764 0.84 ALDH1A1 (0.50) TSHRALDH1A1POLBLMNAMAPT
SCHEMBL6671891 0.83 TSHR (0.42) TSHRALDH1A1GLAPOLBAPOBEC3A
SCHEMBL2398343 0.82 TAAR1 (0.47) TSHRALDH1A1GLALMNATP53
SCHEMBL10939839 0.82 TSHR (0.43) TSHRALDH1A1GLALMNATP53
Water SCHEMBL11410517 0.81 TAAR1 (0.40) TSHRALDH1A1GLAPOLBAPOBEC3A
SCHEMBL2765782 0.81 ALDH1A1 (0.39) TSHRALDH1A1LMNAMEN1KMT2A
SCHEMBL11308081 0.81 TSHR (0.44) TSHRALDH1A1GLALMNATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 713 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114836160-B Room-temperature fast-curing high-elasticity wide-temperature broadband MS/epoxy damping adhesive and preparation method thereof 郑州大学 2023-06-16 CN claimed
CN-115785694-A Preparation and application of phthalate-connected bisazo high-water-washing disperse dye compound 浙江嘉欣兴昌印染有限公司 2023-03-14 CN claimed
CN-115044226-A 3-amino-5-nitrobenzoisothiazole-based dye and preparation method thereof 金塔县晋泰森新材料科技有限公司 2022-09-13 CN claimed
CN-114836160-A Room-temperature fast-curing high-elasticity wide-temperature wide-frequency MS/epoxy damping adhesive and preparation method thereof 郑州大学 2022-08-02 CN claimed
CN-110776440-B Azo reductase responsive polymer fluorescent probe prepared by PISA method and application thereof 苏州大学 2022-07-19 CN claimed
CN-113122122-B High-solid-content polyurethane ink resin, preparation method and application thereof 万华化学(北京)有限公司 2022-07-12 CN claimed
CN-113754859-A Amine-containing thioxanthone polyurethane modified epoxy acrylate LED photocuring resin 明光科迪新材料有限公司 2021-12-07 CN claimed
CN-113736092-A Hyperbranched LED resin modified by amine-containing thioxanthone photoinitiating group 吉力水性新材料科技(珠海)有限公司 2021-12-03 CN claimed
CN-113717370-A 2 nd-generation hyperbranched LED resin modified by amine-containing thioxanthone photoinitiating group 吉力水性新材料科技(珠海)有限公司 2021-11-30 CN claimed
CN-113717393-A 3 rd generation dendritic LED resin modified by amine-containing thioxanthone photoinitiating group 吉力水性新材料科技(珠海)有限公司 2021-11-30 CN claimed
EP-1713835-B1 INITIATING SYSTEM FOR SOLID POLYESTER GRANULE MANUFACTURE ORICA AUSTRALIA PTY LTD (AU) 2010-04-14 EP claimed
EP-1780747-A2 A conductive electrode powder, a method for preparing the same, and uses thereof Samsung SDI Co., Ltd. (KR) 2007-05-02 EP claimed
US-20070092987-A1 Conductive electrode powder, a method for preparing the same, a method for preparing an electrode of a plasma display panel by using the same, and a plasma display panel comprising the same SAMSUNG SDI CO., LTD. (KR) 2007-04-26 US claimed
EP-1153041-B1 INITIATING SYSTEM FOR SOLID POLYESTER GRANULE MANUFACTURE ORICA AUSTRALIA PTY LTD (AU) 2006-05-31 EP claimed
US-20050179355-A1 Composition for forming an electron emission source for use in an electron emission device and an electron emission source prepared therefrom SAMSUNG SDI CO., LTD. (KR) 2005-08-18 US claimed
US-5866627-A UNSATURATED DERIVATIVES OF POLY(OXYDIPHENYLENE- AND P-PHENYLENE BIPHENYLENETETRACARBOXAMIC ACIDS), PHOTOPOLYMERIZABLE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-02-02 US claimed
US-4829187-A COLORIMETRIC INDICATOR, EXPOSURE TO SUNLIGHT SHISEIDO COMPANY LTD. (JP) 1989-05-09 US claimed
EP-0119719-B1 RADIATION SENSITIVE POLYMER COMPOSITION TORAY INDUSTRIES, INC. (JP) 1987-05-06 EP claimed
US-4608333-A INCREASED PHOTOSENSITIVITY BY INCLUDING AN AROMATIC SECONDARY OR TERTIARY AMINE WITH AN ACRYLIC MONOMER AND A POLYIMIDE-CURING POLYAMIDE TORAY INDUSTRIES, INC. (JP) 1986-08-26 US claimed
EP-0119719-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1984-09-26 EP claimed