SCHEMBL415828

SCHEMBL415828

CO[Si](Cc1ccc(C[Si](OC)(OC)OC)cc1)(OC)OC

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.39
IDO1 P14902 3/20 0.33
CA2 P00918 1/20 0.32
AGXT P21549 2/20 0.31
LTA4H P09960 1/20 0.31
TAAR1 Q96RJ0 1/20 0.31
POLB P06746 1/20 0.30
ATM Q13315 1/20 0.30
TSHR P16473 2/20 0.30
ALDH1A1 P00352 1/20 0.30
TP53 P04637 1/20 0.30
CYP3A4 P08684 1/20 0.30
ALOX15 P16050 1/20 0.30
ALOX12 P18054 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL988626 0.90 AGXT (0.43) ESR1IDO1CA2AGXTTAAR1
SCHEMBL3099832 0.90 TP53 (0.40) CA2TAAR1ATMTSHRALDH1A1
SCHEMBL15444222 0.88 CA1 (0.34) ESR1CA2
SCHEMBL17529722 0.88 APP (0.42) IDO1CYP3A4
SCHEMBL938705 0.88 TAAR1 (0.43) IDO1AGXTTAAR1POLBALDH1A1
SCHEMBL17529660 0.88 ESR1 (0.32) ESR1
SCHEMBL17529742 0.88 TAAR1 (0.43) IDO1TAAR1ALDH1A1
SCHEMBL16062869 0.88 ESR1 (0.37) ESR1
SCHEMBL3361270 0.88 ESR1 (0.32) ESR1
SCHEMBL15734527 0.88 TAAR1 (0.43) IDO1AGXTTAAR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 229 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4569015-A1 BIOCOMPATIBLE OXYGEN-SENSITIVE MATERIALS Promega Corporation (US) 2025-06-18 EP claimed
US-20240059961-A1 BIOCOMPATIBLE OXYGEN-SENSITIVE MATERIALS PROMEGA CORPORATION 2024-02-22 US claimed
WO-2024036277-A1 BIOCOMPATIBLE OXYGEN-SENSITIVE MATERIALS PROMEGA CORPORATION (US) 2024-02-15 WO claimed
CN-117343638-A Porous spin-on dielectric coating materials from silicon-containing polymers 上海艾深斯科技有限公司 2024-01-05 CN claimed
WO-2022261559-A9 ANTIFOULING MATERIALS, COMPOSITIONS AND METHODS OF USE ACatechol, Inc. (US) 2023-11-30 WO claimed
EP-2739670-B1 SOL-GEL DERIVED COMPOSITIONS ABS MAT INC (US) 2023-10-11 EP claimed
WO-2022261559-A2 ANTIFOULING MATERIALS, COMPOSITIONS AND METHODS OF USE ACatechol, Inc. (US) 2022-12-15 WO claimed
CN-110756131-B Flexible hollow mesoporous organic silicon oxide with oleophilic inner surface and preparation method thereof 吉林大学第一医院 2022-02-01 CN claimed
US-11162000-B2 Ice release coatings VIRGINIA COMMONWEALTH UNIVERSITY (US) 2021-11-02 US claimed
US-10934504-B2 Laundry treatment compositions comprising perfume and silica microparticles CONOPCO, INC. (US) 2021-03-02 US claimed
US-20070112242-A1 SWELLABLE SOL-GELS, METHODS OF MAKING, AND USE THEREOF THE COLLEGE OF WOOSTER (US) 2007-05-17 US claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
US-20070059211-A1 TNT sensor containing molecularly imprinted sol gel-derived films THE COLLEGE OF WOOSTER (US) 2007-03-15 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240059961-A1 BIOCOMPATIBLE OXYGEN-SENSITIVE MATERIALS COXFA4L2, LOXL1, LOX ESR1 1005/4885IDO1 1235/4885CA2 643/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.