SCHEMBL4165403

SCHEMBL4165403

O=C1CCCCC1[S+](C1CCCCC1)C1CC2CCC1C2

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.33
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA4 P22748 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL4165039 0.88
SCHEMBL4164982 0.86
SCHEMBL4179254 0.82
SCHEMBL4165959 0.82
SCHEMBL7047146 0.81 EPHX2 (0.32) KMT2A
SCHEMBL7048129 0.79 MEN1 (0.34) KMT2A
SCHEMBL758779 0.79 CA1 (0.35) KMT2ACA1CA2CA4
SCHEMBL686045 0.79 KMT2A (0.45) KMT2ACA1CA2CA4
SCHEMBL7049130 0.77
SCHEMBL8169160 0.73 KMT2A (0.39) KMT2ACA1CA2CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed