SCHEMBL7048129

SCHEMBL7048129

O=C1CCCCC1[S+](C1CCCCC1)C1CC2CCC1C2.O=S(=O)([O-])c1ccc(F)cc1F

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
HSD11B1 P28845 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4164982 0.82
SCHEMBL4169752 0.81 MAPT (0.41)
Trifluoromethanesulfonic Acid SCHEMBL4165039 0.80
SCHEMBL4165403 0.79 KMT2A (0.33) KMT2A
SCHEMBL7047146 0.79 EPHX2 (0.32) MEN1KMT2AHSD11B1
SCHEMBL4165959 0.76
SCHEMBL4179254 0.75
SCHEMBL4168701 0.74
SCHEMBL7048765 0.73
SCHEMBL7049130 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed