Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL63904 | 0.87 | CA1 (0.30) | CA1CA2CA4 | |
| SCHEMBL2425149 | 0.82 | — | — | |
| SCHEMBL7708623 | 0.82 | — | — | |
| SCHEMBL6817556 | 0.81 | — | — | |
| SCHEMBL4165403 | 0.79 | KMT2A (0.33) | CA1CA2CA4KMT2A | |
| SCHEMBL3210568 | 0.77 | CA1 (0.50) | CA1CA2CA4KMT2A | |
| SCHEMBL686204 | 0.72 | CA1 (0.45) | CA1CA2CA4KMT2A | |
| SCHEMBL1624383 | 0.71 | — | — | |
| SCHEMBL244365 | 0.71 | KMT2A (0.47) | CA1CA2CA4KMT2A | |
| SCHEMBL5187669 | 0.71 | EPHX1 (0.32) | KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1669421-B1 | Ink composition for a color filter, a color filter substrate manufactured using the ink composition and method of manufacturing a color filter substrate using the ink composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-07-18 | — | — | EP | claimed |
| US-7122294-B2 | Photoacid generators with perfluorinated multifunctional anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-10-17 | — | — | US | claimed |
| US-7078444-B2 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-07-18 | — | — | US | claimed |
| US-20050158655-A1 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2005-07-21 | — | — | US | claimed |
| US-6841333-B2 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2005-01-11 | — | — | US | claimed |
| US-20040234888-A1 | Photoacid generators with perfluorinated multifunctional anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-11-25 | — | — | US | claimed |
| US-20040087690-A1 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-05-06 | — | — | US | claimed |
| US-20030207049-A1 | Liquid crystal display unit and method for manufacturing the same | NEC CORPORATION | 2003-11-06 | — | — | US | claimed |
| US-12612500-B2 | Heat labile foam-in-place polyurethane foam | BATTELLE SAVANNAH RIVER ALLIANCE LLC (US) | 2026-04-28 | — | — | US | disclosed |
| WO-2023053877-A1 | PHOTOACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION | 東洋合成工業株式会社 | 2023-04-06 | — | — | WO | disclosed |
| EP-3346335-A1 | MATERIAL FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILMS FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, PATTERN FORMING METHOD, RESIN, AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-07-11 | — | — | EP | disclosed |
| EP-2955577-B1 | COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-01-31 | — | — | EP | disclosed |
| EP-3269712-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-01-17 | — | — | EP | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-20040191479-A1 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-09-30 | — | — | US | disclosed |
| WO-2004042473-A2 | IONIC PHOTOACID GENERATORS WITH SEGMENTED HYDROCARBON-FLUOROCARBON SULFONATE ANIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2004-05-21 | — | — | WO | disclosed |
| US-20040087690-A1 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-05-06 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| US-20030207049-A1 | Liquid crystal display unit and method for manufacturing the same | NEC CORPORATION | 2003-11-06 | — | — | US | disclosed |
| US-20030198889-A1 | Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions | NEC CORPORATION (JP) | 2003-10-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | CA1 72/4885CA2 27/4885CA4 276/4885 |
| US-12612500-B2 | Heat labile foam-in-place polyurethane foam | PUF60, OGG1, EIF3L | CA1 2151/4885CA2 1065/4885CA4 2860/4885 |
| US-20030198889-A1 | Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions | PPOX, SULT1A1, TST | CA1 1739/4885CA2 405/4885CA4 1332/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.