SCHEMBL4166052

SCHEMBL4166052

O=C(O)CCOCOCCO

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.43
MAPK1 P28482 2/20 0.43
CAMK2A Q9UQM7 1/20 0.42
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
GPR84 Q9NQS5 1/20 0.39
FFAR1 O14842 1/20 0.39
FFAR4 Q5NUL3 1/20 0.39
LMNA P02545 4/20 0.38
EGLN1 Q9GZT9 2/20 0.38
ALKBH5 Q6P6C2 1/20 0.38
SUCNR1 Q9BXA5 1/20 0.38
ALDH1A1 P00352 2/20 0.36
SLC22A6 Q4U2R8 1/20 0.35
NFKB1 P19838 1/20 0.33
PMP22 Q01453 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
FFAR3 O14843 1/20 0.32
HDAC3 O15379 1/20 0.32
HDAC1 Q13547 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL46587 0.90
SCHEMBL18470513 0.89 LMNA (0.47) TSHRMAPK1CAMK2AKMT2ALMNA
SCHEMBL16329219 0.87 MEN1 (0.58) TSHRMAPK1CAMK2AMEN1KMT2A
SCHEMBL2555371 0.87 MEN1 (0.58) TSHRMAPK1CAMK2AMEN1KMT2A
SCHEMBL29282163 0.87 MEN1 (0.58) TSHRMAPK1CAMK2AMEN1KMT2A
SCHEMBL22445005 0.87 MEN1 (0.58) TSHRMAPK1CAMK2AMEN1KMT2A
SCHEMBL19402669 0.87 MEN1 (0.58) TSHRMAPK1CAMK2AMEN1KMT2A
SCHEMBL22445115 0.87 MEN1 (0.58) TSHRMAPK1CAMK2AMEN1KMT2A
SCHEMBL20840356 0.87 MEN1 (0.58) TSHRMAPK1CAMK2AMEN1KMT2A
SCHEMBL4588453 0.87 MEN1 (0.58) TSHRMAPK1CAMK2AMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9329475-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device CHEIL INDUSTRIES INC. (KR) 2016-05-03 US disclosed
US-20150118622-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device CHEIL INDUSTRIES INC. (KR) 2015-04-30 US disclosed
US-20150111153-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device CHEIL INDUSTRIES INC. (KR) 2015-04-23 US disclosed
US-8519408-B2 Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate SAMSUNG DISPLAY CO., LTD. (KR) 2013-08-27 US disclosed
US-20120328991-A1 METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-12-27 US disclosed
US-8278021-B2 Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-10-02 US disclosed
US-20090030103-A1 METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-01-29 US disclosed