SCHEMBL4200985

SCHEMBL4200985

C=C(CC(CC)(CCC)C(=O)OC1CCCCC1)C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.38
EPHX1 P07099 1/20 0.37
CYP19A1 P11511 1/20 0.34
MLNR O43193 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRM3 P20309 1/20 0.32
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
HRH1 P35367 1/20 0.32
OPRM1 P35372 1/20 0.32
DRD3 P35462 1/20 0.32
OPRK1 P41145 1/20 0.32
HTR2B P41595 1/20 0.32
SLC6A3 Q01959 1/20 0.32
KCNH2 Q12809 1/20 0.32
CACNA1C Q13936 1/20 0.32
HTT P42858 2/20 0.31
TET2 Q6N021 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4196696 0.83 NAAA (0.38) NAAAEPHX1CYP19A1MLNRCHRM2
SCHEMBL19690607 0.77 EPHX1 (0.45) NAAAEPHX1CYP19A1MLNRCHRM2
SCHEMBL28784765 0.74 NAAA (0.49) NAAAEPHX1CYP19A1MLNRCHRM2
SCHEMBL28107686 0.72 NAAA (0.47) NAAAEPHX1CYP19A1MLNRCHRM2
SCHEMBL28107682 0.72 EPHX1 (0.46) NAAAEPHX1CYP19A1HTTALDH1A1
SCHEMBL21677330 0.71 NAAA (0.45) NAAAEPHX1CYP19A1MLNRCHRM2
SCHEMBL3434643 0.70 EPHX1 (0.50) NAAAEPHX1CYP19A1CHRM3HTT
SCHEMBL20388945 0.70 EPHX1 (0.50) NAAAEPHX1CYP19A1CHRM3HTT
SCHEMBL131561 0.70 EPHX1 (0.50) NAAAEPHX1CYP19A1CHRM3HTT
SCHEMBL108478 0.70 EPHX1 (0.50) NAAAEPHX1CYP19A1CHRM3HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-20050266351-A1 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED 2005-12-01 US disclosed