SCHEMBL4204012

SCHEMBL4204012

C/C(C(=O)O)=C(/C)C1CCO1

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1822238 1.00 MEN1 (0.30) MEN1KMT2A
SCHEMBL536801 0.90 NOS2 (0.41) MEN1KMT2A
SCHEMBL536803 0.90 NOS2 (0.41) MEN1KMT2A
SCHEMBL17688357 0.81
SCHEMBL1822043 0.75 TDP1 (0.31)
SCHEMBL7701902 0.74
SCHEMBL4429961 0.72
SCHEMBL17928477 0.72
SCHEMBL11666409 0.71
SCHEMBL9929392 0.70 CA1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8481247-B2 Resist underlayer film forming composition containing liquid additive NISSAN CHEMICAL INDUSTRIES, LTD. 2013-07-09 US disclosed
US-20090311624-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-12-17 US disclosed