Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 2/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | ATM | Q13315 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | NSD2 | O96028 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | RAD51 | Q06609 | 1/20 | 0.37 |
| ▸ | BCHE | P06276 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL7861427 | 0.91 | ELANE (0.42) | ELANETDP1ATML3MBTL1ALOX15 | |
| SCHEMBL6658962 | 0.82 | ELANE (0.52) | ELANETDP1ATML3MBTL1ALOX15 | |
| SCHEMBL6313194 | 0.82 | TDP1 (0.47) | ELANETDP1ATML3MBTL1ALOX15 | |
| SCHEMBL5132602 | 0.82 | ELANE (0.52) | ELANETDP1ATML3MBTL1ALOX15 | |
| SCHEMBL13386065 | 0.82 | HSD17B10 (0.50) | ELANETDP1L3MBTL1ALOX15HSD17B10 | |
| SCHEMBL27521888 | 0.82 | ELANE (0.67) | ELANETDP1ATML3MBTL1ALOX15 | |
| Diphenyl Ethanedioat SCHEMBL43364 | 0.81 | TDP1 (0.54) | ELANETDP1ATML3MBTL1ALOX15 | |
| SCHEMBL29246861 | 0.81 | GAA (0.44) | ELANETDP1ATMMAPTKDM4E | |
| SCHEMBL28363001 | 0.80 | ELANE (0.50) | ELANETDP1ATML3MBTL1ALOX15 | |
| SCHEMBL29303770 | 0.79 | LMNA (0.55) | ELANEATML3MBTL1MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1782873-B | Photosensitive resin composition, preparation method thereof and photosensitive film comprising composition | DONGJIN SEMICOM CO LTD | 2010-07-07 | — | — | CN | claimed |
| CN-1782873-A | Photosensitive resin composition and method for preparing the same and photosensitive film comprising the same | DONGJIN SEMICOM CO LTD (KR) | 2006-06-07 | — | — | CN | claimed |
| JP-57118243-A | — | — | None | — | — | JP | disclosed |
| JP-62230749-A | — | — | None | — | — | JP | disclosed |
| JP-63083721-A | — | — | None | — | — | JP | disclosed |
| JP-59049536-A | — | — | None | — | — | JP | disclosed |
| US-20170285482-A1 | ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-8822592-B2 | Aqueous emulsion polymer as dispersant | BASF SE (DE) | 2014-09-02 | — | — | US | disclosed |
| US-20090234062-A1 | Aqueous emulsion polymer as dispersant | CIBA SPECIALTY CHEMICALS CORP. | 2009-09-17 | — | — | US | disclosed |
| EP-1444302-B1 | LEVELLING AGENT AND ANTI-CRATERING AGENT | CIBA HOLDING INC (CH) | 2009-06-17 | — | — | EP | disclosed |
| US-7173084-B2 | Levelling agent and anti-cratering agent | EFKA ADDITIVES B.V. (NL) | 2007-02-06 | — | — | US | disclosed |
| JP-S62230749-A | PRODUCTION OF PHENYL ALPHA-CHLOROACRYLATE | TORAY IND INC | 1987-10-09 | — | — | JP | disclosed |
| EP-0239385-A2 | Radiation-sensitive positive resist and composition containing the same | TORAY INDUSTRIES, INC. (JP) | 1987-09-30 | — | — | EP | disclosed |
| EP-0191462-A1 | Purification of aziridine-2-carboxylic acid salts | RESEARCH ASSOCIATION FOR UTILIZATION OF LIGHT OIL (JP) | 1986-08-20 | — | — | EP | disclosed |
| JP-S5949536-A | FORMATION OF MICROPATTERN | TOSHIBA CORP | 1984-03-22 | — | — | JP | disclosed |
| JP-S57118243-A | FORMATION OF FINE RESIST PATTERN | TOSHIBA CORP | 1982-07-23 | — | — | JP | disclosed |
| US-4304838-A | FILMS FOR PEELABLE DEVELOPMENT | FUJI PHOTO FILM CO., LTD. (JP) | 1981-12-08 | — | — | US | disclosed |
| US-4259407-A | POLYMER OF HALOGENATED ALKYL ALPHA-HALOGENATED ACRYLATE | VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) | 1981-03-31 | — | — | US | disclosed |
| US-4075237-A | Perfluorinated esters of fumaric acid and certain other ethylenically unsaturated poly-basic acid and soil repellant polymers thereof | GEIGY CHEMICAL CORPORATION (US) | 1978-02-21 | — | — | US | disclosed |
| JP-S05949536-A | — | — | 0001-01-01 | — | — | JP | disclosed |