SCHEMBL4222583

SCHEMBL4222583

C=CC(=O)OC(CC[SiH2]OC)(OC(=O)C=C)OC(=O)C=C

nearest known ligand 0.32

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.32
ALDH1A1 P00352 4/20 0.32
TP53 P04637 3/20 0.32
HIF1A Q16665 3/20 0.32
CYP3A4 P08684 2/20 0.32
MAPK1 P28482 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HPGD P15428 1/20 0.32
HSD17B10 Q99714 1/20 0.31
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4227645 0.83 TSHR (0.33) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL4226905 0.80 TSHR (0.39) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL4229451 0.78 TSHR (0.47) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL4221295 0.75 ALDH1A1 (0.43) TSHRALDH1A1THRB
SCHEMBL5271167 0.75 TSHR (0.45) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL4402756 0.72 TSHR (0.52) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL9359065 0.70 TSHR (0.50) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL1706295 0.70 THRB (0.44) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL2530173 0.69 TSHR (0.43) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL28690747 0.69 THRB (0.41) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115109208-A Active energy ray-curable resin composition, coating agent set, cured product, and laminate 荒川化学工业株式会社 2022-09-27 CN disclosed
CN-115109207-A Active energy ray-curable resin composition, coating agent set, cured product, and laminate 荒川化学工业株式会社 2022-09-27 CN disclosed
US-20090263631-A1 FILM FORMING COMPOSITION FOR NANOIMPRINTING AND METHOD FOR PATTERN FORMATION TOKYO OHKA KOGYO CO., LTD. (JP) 2009-10-22 US disclosed