SCHEMBL4223162

SCHEMBL4223162

Cc1ccc(/N=N\c2c(O)ccc3ccccc23)c([N+](=O)[O-])c1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ THRB P10828 3/20 0.67
▸ MEN1 O00255 7/20 0.54
▸ KMT2A Q03164 7/20 0.54
▸ CYP1A2 P05177 3/20 0.54
▸ ALDH1A1 P00352 2/20 0.54
▸ MAPT P10636 5/20 0.49
▸ NPC1 O15118 5/20 0.49
▸ L3MBTL1 Q9Y468 3/20 0.49
▸ MAPK1 P28482 2/20 0.49
▸ KDM4E B2RXH2 1/20 0.49
▸ CYP2C9 P11712 2/20 0.48
▸ TSHR P16473 2/20 0.48
▸ CYP2C19 P33261 2/20 0.48
▸ HSD17B10 Q99714 2/20 0.48
▸ PTPRA P18433 1/20 0.48
▸ PTPRB P23467 1/20 0.48
▸ HIF1A Q16665 1/20 0.48
▸ RAPGEF4 Q8WZA2 1/20 0.48
▸ RAB9A P51151 4/20 0.47
▸ POLB P06746 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29353897 1.00 THRB (0.67) THRBMEN1KMT2ACYP1A2ALDH1A1
SCHEMBL1394498 1.00 THRB (0.67) THRBMEN1KMT2ACYP1A2ALDH1A1
SCHEMBL57955 1.00 THRB (0.67) THRBMEN1KMT2ACYP1A2ALDH1A1
SCHEMBL13475196 0.90 THRB (0.70) THRBMEN1KMT2ACYP1A2ALDH1A1
SCHEMBL29355385 0.87 TSHR (0.57) THRBMEN1KMT2ACYP1A2ALDH1A1
SCHEMBL305525 0.87 TSHR (0.57) THRBMEN1KMT2ACYP1A2ALDH1A1
SCHEMBL305524 0.87 TSHR (0.57) THRBMEN1KMT2ACYP1A2ALDH1A1
SCHEMBL13330222 0.86 THRB (0.52) THRBMEN1KMT2ACYP1A2ALDH1A1
SCHEMBL10809260 0.86 THRB (0.51) THRBMEN1KMT2ACYP1A2ALDH1A1
SCHEMBL5356868 0.86 THRB (0.51) THRBMEN1KMT2ACYP1A2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090311484-A1 Molecular Resist Compositions, Methods of Patterning Substrates Using the Compositions and Process Products Prepared Therefrom NANO TERRA INC. (US) 2009-12-17 — — US disclosed
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