SCHEMBL422504

SCHEMBL422504

CCCCCCCCCCCCCCCCCCNC(=O)Nc1ccccc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 9/20 1.00
ALDH1A1 P00352 2/20 1.00
HTT P42858 1/20 1.00
GHSR Q92847 1/20 0.73
HDAC1 Q13547 2/20 0.68
HDAC8 Q9BY41 1/20 0.68
HDAC6 Q9UBN7 1/20 0.68
LMNA P02545 1/20 0.66
KDM4E B2RXH2 1/20 0.64
HDAC2 Q92769 1/20 0.62
EPHX2 P34913 3/20 0.61
NAAA Q02083 1/20 0.61
S1PR1 P21453 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10599308 1.00 EPHX1 (1.00) EPHX1ALDH1A1HTTGHSRHDAC1
SCHEMBL5020899 1.00 EPHX1 (1.00) EPHX1ALDH1A1HTTGHSRHDAC1
SCHEMBL4138192 1.00 EPHX1 (1.00) EPHX1ALDH1A1HTTGHSRHDAC1
SCHEMBL4603476 1.00 EPHX1 (1.00) EPHX1ALDH1A1HTTGHSRHDAC1
SCHEMBL813735 1.00 EPHX1 (1.00) EPHX1ALDH1A1HTTGHSRHDAC1
SCHEMBL11671083 1.00 EPHX1 (1.00) EPHX1ALDH1A1HTTGHSRHDAC1
SCHEMBL17119069 1.00 EPHX1 (1.00) EPHX1ALDH1A1HTTGHSRHDAC1
SCHEMBL7722626 0.98 EPHX1 (0.97) EPHX1ALDH1A1HTTGHSRHDAC1
Dimethylamine SCHEMBL9100861 0.97 EPHX1 (0.94) EPHX1ALDH1A1HTTGHSRHDAC1
SCHEMBL4604785 0.93 EPHX1 (0.87) EPHX1ALDH1A1HTTGHSRHDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 163 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100022697-A1 PROCESS FOR MICROENCAPSULATION OF PHASE CHANGE MATERIALS, MICROCAPSULES OBTAINED AND USES THEREOF UNVERSIDAD DE CASTILLA-LA MANCHA (ES) 2010-01-28 US claimed
EP-1994063-A1 PROCESS FOR MICROENCAPSULATION OF PHASE CHANGE MATERIALS, MICROCAPSULES OBTAINED AND USES THEREOF Universidad de Castilla-La Mancha (ES) 2008-11-26 EP claimed
WO-2007107171-A1 PROCESS FOR MICROENCAPSULATION OF PHASE CHANGE MATERIALS, MICROCAPSULES OBTAINED AND USES THEREOF UNIVERSIDAD DE CASTILLA-LA MANCHA (ES) 2007-09-27 WO claimed
US-7084192-B2 Polylactic acid composite material and molded body Kabushiki Kaisha Toyota Chuo Kankyusho (JP) 2006-08-01 US claimed
US-5456852-A Microcapsule containing compound capable of undergoing phase transitions and high melting compound; preventing supercooling MITSUBISHI PAPER MILLS LIMITED (JP) 1995-10-10 US claimed
JP-11349553-A None JP disclosed
JP-57087992-A None JP disclosed
EP-4006103-B1 POLYESTER RESIN COMPOSITION AND MOLDED PRODUCT THEREOF TORAY INDUSTRIES (JP) 2025-11-05 EP disclosed
CN-119505192-A Polyester resin, polyester resin composition and molded product thereof 东丽先端材料研究开发(中国)有限公司 2025-02-25 CN disclosed
CN-118755080-A Preparation method of polyamide 66 with high strength and high elongation at break 江苏扬农化工集团有限公司 2024-10-11 CN disclosed
CN-117396187-A Composition for administration in a body cavity comprising cannabidiol 融实医药(海南)有限公司 2024-01-12 CN disclosed
CN-117279623-A Wound treatment composition 融实医药(海南)有限公司 2023-12-22 CN disclosed
US-4888321-A SUBBING AND RECORDING LAYERS EACH CONTAINING HEAT FUSIBLE MATERIAL WITH DEFINED MELTING POINT FUJI PHOTO FILM CO., LTD. (JP) 1989-12-19 US disclosed
US-4835133-A Recording material FUJI PHOTO FILM CO., LTD. (JP) 1989-05-30 US disclosed
US-4682193-A HEAT SENSITIVE, STORAGE STABILITY FUJI PHOTO FILM CO., LTD. (JP) 1987-07-21 US disclosed
US-4533929-A ANIONIC SURFACTANTS AS ANTIFOGGING AGENTS; DIETHYLHEXYL SULFOSUCCINATE FUJI PHOTO FILM CO., LTD. (JP) 1985-08-06 US disclosed
US-4520377-A COLOR FORMING LAYER COMO/SED OF ELECTRON DONATING COLORLESS DYE, ELECTRON ACCEPTING COMPOUND, NAPHTHOL UREA AND/OR URETHANE DERIVATIVE FUJI PHOTO FILM CO., LTD. (JP) 1985-05-28 US disclosed
US-4401717-A CONTAINING A CHROMOGEN, A PHENOL LAND A UREA OR CARBAMATE; THERMOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 1983-08-30 US disclosed
JP-S5787992-A HEAT-SENSITIVE RECORDING MATERIAL DAI SHOWA SEISHI KK 1982-06-01 JP disclosed
US-4282147-A Dispersion of aromatic isocyanatosulfonic acid uretdiones in organic polyisocyanates and a process for their preparation BAYER AKTIENGESELLSCHAFT (DE) 1981-08-04 US disclosed