SCHEMBL422680

SCHEMBL422680

CC=CC(=O)OCCCOC(=O)C1CCCCC1C(=O)OCCCOC(=O)C=CC

nearest known ligand 0.56

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.42
CYP3A4 P08684 2/20 0.40
TP53 P04637 1/20 0.40
HCAR2 Q8TDS4 4/20 0.38
GSTP1 P09211 1/20 0.36
FKBP1A P62942 5/20 0.34
MAPT P10636 1/20 0.33
RAB9A P51151 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
TSHR P16473 2/20 0.33
HPGD P15428 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27174186 0.97 ATM (0.42) ATMCYP3A4TP53HCAR2GSTP1
SCHEMBL20854995 0.93 TP53 (0.42) ATMCYP3A4TP53HCAR2GSTP1
SCHEMBL20913247 0.80 ATM (0.60) ATMCYP3A4HCAR2GSTP1MAPT
SCHEMBL27660487 0.80 TP53 (0.41) CYP3A4TP53GSTP1TSHR
SCHEMBL27056296 0.80 TSHR (0.55) ATMCYP3A4TP53TSHRHPGD
SCHEMBL26617293 0.79 TP53 (0.41) CYP3A4TP53ALDH1A1
SCHEMBL11243556 0.79 ATM (0.54) ATMCYP3A4TP53HCAR2GSTP1
SCHEMBL20394541 0.78 ATM (0.64) ATMCYP3A4HCAR2GSTP1MAPT
SCHEMBL20995364 0.77 TSHR (0.47) CYP3A4TP53FKBP1ATSHRHPGD
SCHEMBL9062773 0.77 TSHR (0.60) ATMCYP3A4TP53HCAR2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024128154-A1 AQUEOUS COMPOSITION FOR SCREW-MEMBER COATING, AND SCREW MEMBER 株式会社スリーボンド 2024-06-20 WO disclosed
US-20240191110-A1 CURABLE RESIN COMPOSITION, A CURED PRODUCT, A LAMINATED BODY COMPOSED OF A CURED PRODUCT, AND A METHOD FOR DISASSEMBLING THEREOF THREEBOND CO., LTD. (JP) 2024-06-13 US disclosed
EP-4382543-A1 A CURABLE RESIN COMPOSITION, A CURED PRODUCT, A LAMINATED BODY COMPOSED OF A CURED PRODUCT, AND A METHOD FOR DISASSEMBLING THEREOF ThreeBond Co., Ltd. (JP) 2024-06-12 EP disclosed
WO-2024095925-A1 PHOTOCURABLE COMPOSITION FOR NAILS OR ARTIFICIAL NAILS 株式会社スリーボンド 2024-05-10 WO disclosed
WO-2024095924-A1 PHOTOCURABLE COMPOSITION FOR NAILS OR ARTIFICIAL NAILS 株式会社スリーボンド 2024-05-10 WO disclosed
US-20240091127-A1 PHOTOCURABLE RESIN COMPOSITION FOR NAILS OR ARTIFICIAL NAILS, CURED PRODUCT, AND METHOD FOR COATING NAILS OR ARTIFICIAL NAILS THREEBOND CO., LTD. (JP) 2024-03-21 US disclosed
US-20210139754-A1 PHOTOCURABLE ADHESIVE SHEET, LAMINATE FOR IMAGE DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE MITSUBISHI CHEMICAL CORPORATION (JP) 2021-05-13 US disclosed
US-20170160637-A9 UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD JSR CORPORATION (JP) 2017-06-08 US disclosed
US-20160109801-A1 UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD JSR CORPORATION (JP) 2016-04-21 US disclosed
US-9261789-B2 Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method JSR CORPORATION (JP) 2016-02-16 US disclosed
US-8697344-B2 Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20130216961-A1 COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN JSR CORPORATION (JP) 2013-08-22 US disclosed
US-8431332-B2 Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern JSR CORPORATION (JP) 2013-04-30 US disclosed
US-20120021359-A1 UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD JSR CORPORATION (JP) 2012-01-26 US disclosed
US-20100255416-A1 COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN JSR CORPORATION (JP) 2010-10-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240091127-A1 PHOTOCURABLE RESIN COMPOSITION FOR NAILS OR ARTIFICIAL NAILS, CURED PRODUCT, AND METHOD FOR COATING NAILS OR ARTIFICIAL NAILS POLR1C, NACA, ACR ATM 1390/4885CYP3A4 3740/4885TP53 2075/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.