SCHEMBL422719

SCHEMBL422719

OB(O)Oc1cccc2ccc3cc4ccccc4cc3c12.c1ccc(C[PH](c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.32

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
GRIN1 Q05586 1/20 0.30
GRIN2B Q13224 1/20 0.30
MRGPRX4 Q96LA9 1/20 0.30
ERBB2 P04626 1/20 0.30
CYP1A2 P05177 1/20 0.30
FYN P06241 1/20 0.30
MAOA P21397 1/20 0.30
ACHE P22303 1/20 0.30
AHR P35869 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7639956 0.88 ERBB2 (0.31) ERBB2CYP1A2FYNMAOAACHE
SCHEMBL7645167 0.87 RXRA (0.31) ERBB2CYP1A2FYNMAOAACHE
SCHEMBL7642229 0.87 ERBB2 (0.31) ERBB2CYP1A2FYNMAOAACHE
SCHEMBL424403 0.85 ERBB2 (0.34) ERBB2CYP1A2FYNMAOAACHE
SCHEMBL7644060 0.85 RXRA (0.32)
SCHEMBL7639887 0.85 RXRA (0.30)
SCHEMBL7645644 0.84 GRIN1 (0.33) GRIN1GRIN2BCYP1A2
SCHEMBL19259375 0.83 CYP1A2 (0.41) ERBB2CYP1A2FYNMAOAACHE
SCHEMBL7639889 0.83 KCNH2 (0.31)
SCHEMBL7643793 0.83 RXRA (0.33) ERBB2CYP1A2FYNMAOAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316575-B1 MELT TRANSESTERIFICATION OF DIOL COMPOUND AND CARBOANTE COMPOUND USING CATALYST COMPRISING A PHOSPHORUS-CONTAINING BASIC COMPOUND QUATERNARY PHOSPHONIUM SALT TO FORM POLYCARBONATE IDEMITSU KOSAN CO., LTD. (JP) 2001-11-13 US claimed
US-9911683-B2 Film for back surface of flip-chip semiconductor NITTO DENKO CORPORATION (JP) 2018-03-06 US disclosed
US-9196533-B2 Film for back surface of flip-chip semiconductor, dicing-tape-integrated film for back surface of semiconductor, process for producing semiconductor device, and flip-chip semiconductor device NITTO DENKO CORPORATION (JP) 2015-11-24 US disclosed
US-9074113-B2 Film for flip chip type semiconductor back surface, dicing tape-integrated film for semiconductor back surface, process for producing semiconductor device, and flip chip type semiconductor device NITTO DENKO CORPORATION (JP) 2015-07-07 US disclosed
US-8896134-B2 2014-11-25 US disclosed
US-8450189-B2 Film for flip chip type semiconductor back surface NITTO DENKO CORPORATION (JP) 2013-05-28 US disclosed
US-20130099394-A1 FILM FOR BACK SURFACE OF FLIP-CHIP SEMICONDUCTOR NITTO DENKO CORPORATION (JP) 2013-04-25 US disclosed
US-20130095639-A1 FILM FOR BACK SURFACE OF FLIP-CHIP SEMICONDUCTOR, DICING-TAPE-INTEGRATED FILM FOR BACK SURFACE OF SEMICONDUCTOR, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND FLIP-CHIP SEMICONDUCTOR DEVICE NITTO DENKO CORPORATION (JP) 2013-04-18 US disclosed
US-20120025404-A1 FILM FOR FLIP CHIP TYPE SEMICONDUCTOR BACK SURFACE NITTO DENKO CORPORATION (JP) 2012-02-02 US disclosed
US-20120021174-A1 FILM FOR FLIP CHIP TYPE SEMICONDUCTOR BACK SURFACE, AND DICING TAPE-INTEGRATED FILM FOR SEMICONDUCTOR BACK SURFACE NITTO DENKO CORPORATION (JP) 2012-01-26 US disclosed
US-6462165-B1 REDUCED CONTENT OF IMPURITIES SUCH AS REMAINING MONOMERS AND OLIGOMERS AND HAVING EXCELLENT PHYSICAL PROPERTIES SUCH AS IMPACT STRENGTH, AND ALSO TO OPTICAL MATERIALS AND BLOW MOLDING MATERIALS IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2002-10-08 US disclosed
US-6399738-B1 OXIDATIVE CARBONYLATION OF AROMATIC HYDROXY COMPOUND WITH CARBON MONOXIDE AND OXYGEN IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2002-06-04 US disclosed
US-6316575-B1 MELT TRANSESTERIFICATION OF DIOL COMPOUND AND CARBOANTE COMPOUND USING CATALYST COMPRISING A PHOSPHORUS-CONTAINING BASIC COMPOUND QUATERNARY PHOSPHONIUM SALT TO FORM POLYCARBONATE IDEMITSU KOSAN CO., LTD. (JP) 2001-11-13 US disclosed
US-6258922-B1 TRANSESTERIFICATION A DICARBONATE AND DIHYDROXY COMPOUND IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2001-07-10 US disclosed
US-6245878-B1 POLYMERIZING POLYCARBONATE PREPOLYMER IN SOLID PHASE IN PRESENCE OF PHOSPHORUS-CONTAINING BASIC COMPOUND AS CATALYST IN ATMOSPHERE OF POOR SOLVENT GAS SELECTED FROM LINEAR ALIPHATIC HYDROCARBONS AND CYCLOALIPHATIC HYDROCARBONS IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2001-06-12 US disclosed
EP-1069146-A1 POLYCARBONATE AND OPTICAL MATERIAL Idemitsu Petrochemical Co., Ltd. (JP) 2001-01-17 EP disclosed
EP-1048684-A1 PROCESS FOR PRODUCING POLYCARBONATE AND OPTICAL-DISK SUBSTRATE Idemitsu Petrochemical Co., Ltd. (JP) 2000-11-02 EP disclosed
EP-1035150-A1 COPOLYCARBONATE AND PROCESS FOR PRODUCING THE SAME IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2000-09-13 EP disclosed
EP-1033381-A1 PROCESS FOR PRODUCING POLYCARBONATE IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2000-09-06 EP disclosed
EP-0908484-A1 PROCESSES FOR THE PRODUCTION OF POLYCARBONATE IDEMITSU KOSAN COMPANY LIMITED (JP) 1999-04-14 EP disclosed