Hydrochloric Acid

Hydrochloric Acid

SCHEMBL4227553

CN(C)c1ccc2c(c1)SC1=C(C=CC(=[N+](C)C)C1)N2.[Cl-]

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17363623 0.99 MAPT (0.34) MAPT
Hydrochloric Acid SCHEMBL1813062 0.82 MAPT (0.35) MAPT
Hydrochloric Acid SCHEMBL1814424 0.81 — —
SCHEMBL3112042 0.81 MAPT (0.36) MAPT
SCHEMBL8982039 0.81 MAPT (0.36) MAPT
SCHEMBL11286802 0.80 MAPT (0.35) MAPT
Hydrochloric Acid SCHEMBL1756449 0.80 MAPT (0.35) MAPT
SCHEMBL17363539 0.79 NOX1 (0.43) MAPT
SCHEMBL6470714 0.77 LRRK2 (0.36) MAPT
Hydrochloric Acid SCHEMBL8441856 0.71 MAPT (0.39) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090311484-A1 Molecular Resist Compositions, Methods of Patterning Substrates Using the Compositions and Process Products Prepared Therefrom NANO TERRA INC. (US) 2009-12-17 — — US disclosed
WO-2009137049-A1 MOLECULAR RESIST COMPOSITIONS, METHODS OF PATTERNING SUBSTRATES USING THE COMPOSITIONS AND PROCESS PRODUCTS PREPARED THEREFROM NANO TERRA INC. (US) 2009-11-12 — — WO disclosed
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