Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.32 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 1/20 | 0.32 |
| ▸ | HTR2C | P28335 | 1/20 | 0.32 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.32 |
| ▸ | HRH1 | P35367 | 1/20 | 0.32 |
| ▸ | DRD3 | P35462 | 1/20 | 0.32 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.32 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.32 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | FDPS | P14324 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13314790 | 0.92 | LMNA (0.42) | LMNATSHRSPHK1CHRM1AKR1A1 | |
| SCHEMBL18961176 | 0.92 | LMNA (0.42) | LMNATSHRSPHK1CHRM1AKR1A1 | |
| SCHEMBL1767673 | 0.83 | SPHK1 (0.48) | LMNASPHK1TRPV1CYP3A4FDPS | |
| SCHEMBL13176655 | 0.82 | LMNA (0.44) | LMNATSHRSPHK1CHRM1AKR1A1 | |
| SCHEMBL105182 | 0.82 | LMNA (0.44) | LMNATSHRSPHK1CHRM1AKR1A1 | |
| SCHEMBL1302022 | 0.81 | — | — | |
| SCHEMBL1301102 | 0.81 | — | — | |
| SCHEMBL19125432 | 0.81 | — | — | |
| SCHEMBL1301003 | 0.81 | — | — | |
| SCHEMBL2984846 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4621488-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | Ycchem Co., Ltd. (KR) | 2025-09-24 | — | — | EP | claimed |
| US-20250236813-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | YCCHEM CO., LTD. (KR) | 2025-07-24 | — | — | US | claimed |
| CN-120019333-A | Flushing liquid composition for extreme ultraviolet lithography and pattern forming method using same | YC化学制品株式会社 | 2025-05-16 | — | — | CN | claimed |
| WO-2024106711-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | 와이씨켐 주식회사 | 2024-05-23 | — | — | WO | claimed |
| US-20230266672-A1 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-08-24 | — | — | US | claimed |
| EP-4212958-A1 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | Young Chang Chemical Co., Ltd. (KR) | 2023-07-19 | — | — | EP | claimed |
| CN-116097398-A | Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same | 荣昌化学制品株式会社 | 2023-05-09 | — | — | CN | claimed |
| US-20220342313-A1 | PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2022-10-27 | — | — | US | claimed |
| EP-4036648-A1 | PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | Young Chang Chemical Co., Ltd. (KR) | 2022-08-03 | — | — | EP | claimed |
| CN-114450640-A | Process liquid composition for lithography and pattern formation method using the same | 荣昌化学制品株式会社 | 2022-05-06 | — | — | CN | claimed |
| WO-2022055128-A1 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | 영창케미칼 주식회사 | 2022-03-17 | — | — | WO | claimed |
| WO-2021060672-A1 | PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | 영창케미칼 주식회사 | 2021-04-01 | — | — | WO | claimed |
| US-7550239-B2 | Alkyltriol titanyl phthalocyanine photoconductors | XEROX CORPORATION (US) | 2009-06-23 | — | — | US | claimed |
| US-20080176155-A1 | Alkyltriol titanyl phthalocyanine photoconductors | XEROX CORPORATION | 2008-07-24 | — | — | US | claimed |
| US-5030550-A | Containing a basic compound and a nonionic surfactant containing oxyethylene and oxypropylene groups | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | claimed |
| EP-4621488-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | Ycchem Co., Ltd. (KR) | 2025-09-24 | — | — | EP | disclosed |
| US-20250236813-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | YCCHEM CO., LTD. (KR) | 2025-07-24 | — | — | US | disclosed |
| US-5684026-A | GLYCOSIDASE INHIBITOR | SEIKAGAKU KOGYO KABUSHIKI KAISHA (SEIKAGAKU CORPORATION) (JP) | 1997-11-04 | — | — | US | disclosed |
| CN-1131672-A | Aminocyclopentane derivative | SEIKAGAKU KOGYO CO LTD (JP) | 1996-09-25 | — | — | CN | disclosed |
| US-5030550-A | Containing a basic compound and a nonionic surfactant containing oxyethylene and oxypropylene groups | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |