SCHEMBL4237603

SCHEMBL4237603

C=C(C(=O)OC)C1COC(C)(CC)O1

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33
MEN1 O00255 1/20 0.30
LMNA P02545 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29130125 0.84 ALDH1A1 (0.31) ALDH1A1
SCHEMBL16668440 0.83 MEN1 (0.32) MEN1LMNAKMT2A
SCHEMBL10716759 0.82 ALDH1A1 (0.39) ALDH1A1
SCHEMBL28719574 0.81 MEN1 (0.33) MEN1LMNAKMT2A
SCHEMBL10518183 0.75 MEN1 (0.35) MEN1LMNAKMT2A
SCHEMBL4237609 0.74 ALDH1A1 (0.39) ALDH1A1MEN1LMNAKMT2A
SCHEMBL22499895 0.73
SCHEMBL11667551 0.72 ALDH1A1 (0.31) ALDH1A1
SCHEMBL21049862 0.72
SCHEMBL4389231 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116583571-A UV curable inkjet inks and inkjet printing methods 爱克发有限公司 2023-08-11 CN claimed
WO-2021117836-A1 PHOTOCURABLE MATERIAL COMPOSITION, AND CURED PRODUCT OF PHOTOCURABLE MATERIAL COMPOSITION AND METHOD FOR MANUFACTURING SAME キヤノン株式会社 2021-06-17 WO claimed
EP-3067395-B1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER SEIKO EPSON CORP (JP) 2020-10-28 EP claimed
US-10392522-B2 Ultraviolet curable composition and recorded object SEIKO EPSON CORPORATION (JP) 2019-08-27 US claimed
US-10279603-B2 Production method of recording material, and recording material SEIKO EPSON CORPORATION (JP) 2019-05-07 US claimed
EP-3067396-B1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT SEIKO EPSON CORP (JP) 2019-04-17 EP claimed
US-20190071582-A1 ULTRAVIOLET-CURABLE COMPOSITION AND RECORDED MATTER SEIKO EPSON CORP (JP) 2019-03-07 US claimed
US-10155873-B2 Ultraviolet-curable composition and recorded matter SEIKO EPSON CORPORATION (JP) 2018-12-18 US claimed
US-20170137653-A1 ULTRAVIOLET-CURABLE COMPOSITION AND RECORDED MATTER SEIKO EPSON CORPORATION (JP) 2017-05-18 US claimed
US-20170137642-A1 ULTRAVIOLET-CURABLE COMPOSITION AND RECORDED MATTER SEIKO EPSON CORPORATION (JP) 2017-05-18 US claimed
US-20170028743-A1 PRODUCTION METHOD OF RECORDING MATERIAL, AND RECORDING MATERIAL SEIKO EPSON CORPORATION (JP) 2017-02-02 US claimed
US-9498975-B2 Production method of recording material, and recording material SEIKO EPSON CORPORATION (JP) 2016-11-22 US claimed
US-20160264794-A1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT SEIKO EPSON CORPORATION (JP) 2016-09-15 US claimed
EP-3067395-A1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER Seiko Epson Corporation (JP) 2016-09-14 EP claimed
EP-3067396-A1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT Seiko Epson Corporation (JP) 2016-09-14 EP claimed
US-20160257827-A1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT SEIKO EPSON CORPORATION (JP) 2016-09-08 US claimed
EP-2871062-B1 Production method of recording material, and recording material SEIKO EPSON CORP (JP) 2016-08-17 EP claimed
EP-2871062-A1 Production method of recording material, and recording material Seiko Epson Corporation (JP) 2015-05-13 EP claimed
US-20150125671-A1 PRODUCTION METHOD OF RECORDING MATERIAL, AND RECORDING MATERIAL SEIKO EPSON CORPORATION (JP) 2015-05-07 US claimed
CN-115943077-B Crosslinkable composition comprising mono (meth) acrylate having 1, 3-dioxolane ring 阿科玛法国公司 2024-07-16 CN disclosed
EP-4382450-A1 PIGMENT COMPOSITION, COLORANT COMPOSITION, PAINT, INK, INK SET, PRINTED ARTICLE, AND PACKAGING MATERIAL artience Co., Ltd. (JP) 2024-06-12 EP disclosed
CN-118055983-A Free radical curable inkjet inks 爱克发有限公司 2024-05-17 CN disclosed
CN-117806119-A Configuring optical layers in imprint lithography processes 分子印记公司 2024-04-02 CN disclosed
CN-114729210-B Laminate with wear layer containing inorganic nanoparticles and radiation curable ink containing inorganic nanoparticles having low viscosity 3M创新有限公司 2024-03-12 CN disclosed
CN-115651575-B Epoxy resin material and preparation method and application thereof 江苏中科科化新材料股份有限公司 2024-03-01 CN disclosed
CN-117500855-A Curable resin composition, and cured film and laminate using same 大阪有机化学工业株式会社 2024-02-02 CN disclosed
CN-110023234-B Configuring optical layers in imprint lithography processes 分子印记公司 2024-01-09 CN disclosed
CN-117285897-A Epoxy resin sealant and preparation method and application thereof 江苏中科科化新材料股份有限公司 2023-12-26 CN disclosed
CN-110366703-B Substrate pretreatment composition for nanoimprint lithography 佳能株式会社 2023-11-14 CN disclosed
CN-111708260-B Substrate pretreatment to reduce fill time in nanoimprint lithography 佳能株式会社 2023-11-10 CN disclosed
US-11753560-B2 Ink set, recording method, and printed item TOYO INK SC HOLDINGS CO., LTD. (JP) 2023-09-12 US disclosed
CN-116635954-A Wire harness 株式会社自动网络技术研究所 2023-08-22 CN disclosed
CN-116583571-A UV curable inkjet inks and inkjet printing methods 爱克发有限公司 2023-08-11 CN disclosed
CN-116554416-A Photocurable resin composition, image display device, and method for manufacturing image display device 迪睿合株式会社 2023-08-08 CN disclosed
CN-116449646-A Configuring optical layers in imprint lithography processes 分子印记公司 2023-07-18 CN disclosed
CN-116249756-A Ink composition for inkjet, light conversion layer, and color filter DIC株式会社 2023-06-09 CN disclosed
CN-113195429-B Interlayer film for laminated glass and laminated glass 积水化学工业株式会社 2023-05-30 CN disclosed
CN-109075031-B Pattern forming method, manufacturing method of processed substrate, manufacturing method of optical component, manufacturing method of circuit board, manufacturing method of electronic component, and manufacturing method of imprint mold 佳能株式会社 2023-05-16 CN disclosed
CN-109563217-B Photocurable resin composition, image display device, and method for manufacturing image display device 迪睿合株式会社 2023-05-16 CN disclosed
CN-116097138-A Polarizing plate and image display device using same 日东电工株式会社 2023-05-09 CN disclosed
CN-116097137-A Polarizing plate and image display device using same 日东电工株式会社 2023-05-09 CN disclosed
CN-110383168-B Configuring optical layers in imprint lithography processes 分子印记公司 2023-04-28 CN disclosed
CN-116018363-A Resin composition, method for producing resin composition, and cured body 积水化学工业株式会社 2023-04-25 CN disclosed
CN-115838456-A Photocurable composition and molded body formed from same 住友橡胶工业株式会社 2023-03-24 CN disclosed
US-20230091783-A1 PHOTOCURABLE COMPOSITION AND SHAPED PRODUCT FORMED FROM THE SAME SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2023-03-23 US disclosed
EP-4151664-A1 PHOTOCURABLE COMPOSITION AND SHAPED PRODUCT FORMED FROM THE SAME Sumitomo Rubber Industries, Ltd. (JP) 2023-03-22 EP disclosed
WO-2023286699-A1 CURABLE RESIN COMPOSITION ナミックス株式会社 2023-01-19 WO disclosed
CN-111065685-B Macromonomer copolymer, epoxy resin composition, adhesive, molding material, and cured product 三菱化学株式会社 2022-12-23 CN disclosed
EP-4105268-A1 LIQUID COMPOSITION SET, POROUS RESIN PRODUCING APPARATUS AND METHOD FOR PRODUCING POROUS RESIN Ricoh Company, Ltd. (JP) 2022-12-21 EP disclosed
EP-4084957-A1 CROSSLINKABLE COMPOSITION COMPRISING A MONO(METH)ACRYLATE HAVING A 1,3 DIOXOLANE RING ARKEMA FRANCE (FR) 2022-11-09 EP disclosed
WO-2022202607-A1 SOLID OR GEL ELECTROLYTE, CURED-TYPE COMPOSITION FOR SOLID OR GEL ELECTROLYTE, AND LITHIUM ION SECONDARY BATTERY 東亞合成株式会社 2022-09-29 WO disclosed
CN-110573583-B Active energy ray-curable ink and method for producing printed matter DIC株式会社 2022-08-02 CN disclosed
CN-114729210-A Laminate with an abrasion resistant layer comprising inorganic nanoparticles and radiation curable ink comprising inorganic nanoparticles having a low viscosity 3M创新有限公司 2022-07-08 CN disclosed
CN-114585704-A Conductive adhesive, adhesive structure using same, and electronic component 日本化学工业株式会社 2022-06-03 CN disclosed
EP-3991972-A1 INK SET, RECORDING METHOD, AND PRINTED MATTER Toyo Ink SC Holdings Co., Ltd. (JP) 2022-05-04 EP disclosed
CN-114206958-A Fluoropolymer for metal-clad laminate, composition for metal-clad laminate, curable composition, metal-clad laminate, and printed board 大金工业株式会社 2022-03-18 CN disclosed
CN-114080406-A Curable resin composition, elastomer, and sheet 大阪有机化学工业株式会社 2022-02-22 CN disclosed
CN-109952537-B Positioning a substrate in an imprint lithography process 分子印记公司 2021-12-24 CN disclosed
CN-113710721-A Epoxy resin composition, curable resin composition, cured product, and adhesive 三菱化学株式会社 2021-11-26 CN disclosed
CN-107148453-B Photocurable composition 思美定株式会社 2021-08-17 CN disclosed
CN-113219690-A Liquid crystal display element and method for manufacturing the same, radiation-sensitive composition, interlayer insulating film and method for manufacturing the same JSR株式会社 2021-08-06 CN disclosed
CN-113122176-A Resin composition, adhesive member, and display device including the same 三星显示有限公司 2021-07-16 CN disclosed
WO-2021136721-A1 CROSSLINKABLE COMPOSITION COMPRISING A MONO(METH)ACRYLATE HAVING A 1,3 DIOXOLANE RING ARKEMA FRANCE (FR) 2021-07-08 WO disclosed
WO-2021117836-A1 PHOTOCURABLE MATERIAL COMPOSITION, AND CURED PRODUCT OF PHOTOCURABLE MATERIAL COMPOSITION AND METHOD FOR MANUFACTURING SAME キヤノン株式会社 2021-06-17 WO disclosed
US-10973742-B2 Photocurable composition, denture base, and plate denture MITSUI CHEMICALS, INC. (JP) 2021-04-13 US disclosed
WO-2021053953-A1 DISPERSION, INK COMPOSITION, AND PRINTED ARTICLE 株式会社DNPファインケミカル 2021-03-25 WO disclosed
WO-2021039320-A1 PHOTOCURABLE COMPOSITION, CURED BODY THEREOF, SEALING MATERIAL, PROTECTIVE MATERIAL, WATERPROOF STRUCTURE, AND CURED BODY PRODUCTION METHOD 積水ポリマテック株式会社 2021-03-04 WO disclosed
WO-2021025117-A1 FLUORINE-CONTAINING POLYMER FOR METAL-CLAD LAMINATED SHEET, COMPOSITION FOR METAL-CLAD LAMINATED SHEET, CURABLE COMPOSITION, METAL-CLAD LAMINATED SHEET AND PRINTED SUBSTRATE ダイキン工業株式会社 2021-02-11 WO disclosed
WO-2021020499-A1 CURABLE RESIN COMPOSITION, ELASTOMER AND SHEET 大阪有機化学工業株式会社 2021-02-04 WO disclosed
WO-2020246562-A1 RESIN COMPOSITION, RESIN FILM, AND GLASS LAMINATE 積水化学工業株式会社 2020-12-10 WO disclosed
EP-3401373-B1 UV-CURABLE INKJET INK COMPOSITION SHOWA ALUMINUM CAN CORP (JP) 2020-11-25 EP disclosed
WO-2020230875-A1 ADHESIVE SHEET AND LAMINATE 王子ホールディングス株式会社 2020-11-19 WO disclosed
CN-111902432-A Curable composition, cured product thereof, and electronic component having same 太阳油墨制造株式会社 2020-11-06 CN disclosed
EP-3067395-B1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER SEIKO EPSON CORP (JP) 2020-10-28 EP disclosed
WO-2020203970-A1 MATTING INK COMPOSITION, LAYERED BODY MANUFACTURED BY USING SAME, AND METHOD FOR MANUFACTURING LAYERED BODY 株式会社DNPファインケミカル 2020-10-08 WO disclosed
CN-111532046-A Shaped body 世联株式会社 2020-08-14 CN disclosed
CN-111433296-A Ink composition 大日本涂料株式会社 2020-07-17 CN disclosed
US-10709530-B2 Photocurable composition, denture base, and plate denture MITSUI CHEMICALS, INC. (JP) 2020-07-14 US disclosed
EP-2702112-B1 CURABLE ELASTOMER COMPOSITIONS WITH LOW TEMPERATURE SEALING CAPABILITY Henkel IP & Holding GmbH (DE) 2020-05-13 EP disclosed
CN-111065685-A Macromonomer copolymer, epoxy resin composition, adhesive, molding material, and cured product 三菱化学株式会社 2020-04-24 CN disclosed
US-10611920-B2 Curable composition, curable ink, method for forming two-dimensional or three-dimensional images, apparatus for forming two-dimensional or three-dimensional images, cured product, structural body, and processed product RICOH COMPANY, LTD. (JP) 2020-04-07 US disclosed
US-10584253-B2 Light-curable inkjet printing ink composition SAKATA INX CORPORATION (JP) 2020-03-10 US disclosed
US-10562995-B2 Photocurable composition, denture base, and plate denture MITSUI CHEMICALS, INC. (JP) 2020-02-18 US disclosed
WO-2020031557-A1 INTERMEDIATE FILM FOR LAMINATED GLASSES, AND LAMINATED GLASS 積水化学工業株式会社 2020-02-13 WO disclosed
WO-2020027103-A1 CURABLE RESIN COMPOSITION, POLYMER, (METH)ACRYLIC ELASTOMER AND SHEET 大阪有機化学工業株式会社 2020-02-06 WO disclosed
US-20200040117-A1 (METH)ACRYLIC RESIN AND METHOD FOR CONTROLLING STRAIN THEREOF OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) 2020-02-06 US disclosed
EP-3604358-A1 (METH)ACRYLIC RESIN AND METHOD FOR CONTROLLING STRAIN THEREOF Osaka Organic Chemical Industry Ltd. (JP) 2020-02-05 EP disclosed
CN-107001888-B Adhesive composition, adhesive sheet, double-sided adhesive sheet, adhesive for transparent electrode, touch panel, and image display device 三菱化学株式会社 2020-01-21 CN disclosed
CN-110662774-A (meth) acrylic resin and method for adjusting strain thereof 大阪有机化学工业株式会社 2020-01-07 CN disclosed
CN-110621744-A Resin film and laminate comprising glass plate 积水化学工业株式会社 2019-12-27 CN disclosed
CN-110573583-A Active energy ray-curable ink and method for producing printed matter DIC株式会社 2019-12-13 CN disclosed
US-10479903-B2 UV-curable inkjet ink composition SHOWA ALUMINUM CAN CORPORATION (JP) 2019-11-19 US disclosed
WO-2019198545-A1 ADHESIVE 積水化学工業株式会社 2019-10-17 WO disclosed
US-20190275773-A1 PHOTOCURABLE RESIN COMPOSITION, IMAGE DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE MANUFACTURING METHOD DEXERIALS CORPORATION (JP) 2019-09-12 US disclosed
WO-2019172347-A1 CURABLE COMPOSITION FOR POLYMER ELECTROLYTE, AND LAMINATE 東亞合成株式会社 2019-09-12 WO disclosed
US-10392522-B2 Ultraviolet curable composition and recorded object SEIKO EPSON CORPORATION (JP) 2019-08-27 US disclosed
US-20190175455-A1 PHOTOCURABLE COMPOSITION, DENTURE BASE, AND PLATE DENTURE MITSUI CHEMICALS, INC. (JP) 2019-06-13 US disclosed
EP-3494954-A1 PHOTOCURABLE COMPOSITION, DENTURE BASE, AND REMOVABLE DENTURE Mitsui Chemicals, Inc. (JP) 2019-06-12 EP disclosed
US-10279603-B2 Production method of recording material, and recording material SEIKO EPSON CORPORATION (JP) 2019-05-07 US disclosed
EP-3067396-B1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT SEIKO EPSON CORP (JP) 2019-04-17 EP disclosed
US-20190071582-A1 ULTRAVIOLET-CURABLE COMPOSITION AND RECORDED MATTER SEIKO EPSON CORP (JP) 2019-03-07 US disclosed
US-20190031895-A1 LIGHT-CURABLE INKJET PRINTING INK COMPOSITION SAKATA INX CORPORATION (JP) 2019-01-31 US disclosed
US-20180371271-A1 UV-CURABLE INKJET INK COMPOSITION SHOWA ALUMINUM CAN CORPORATION (JP) 2018-12-27 US disclosed
US-10155873-B2 Ultraviolet-curable composition and recorded matter SEIKO EPSON CORPORATION (JP) 2018-12-18 US disclosed
EP-3412738-A1 PHOTOCURABLE INK COMPOSITION FOR INKJET PRINTING Sakata INX Corp. (JP) 2018-12-12 EP disclosed
US-20180282455-A1 PHOTOCURABLE COMPOSITION, DENTURE BASE, AND PLATE DENTURE MITSUI CHEMICALS, INC. (JP) 2018-10-04 US disclosed
US-20180014919-A1 PHOTOCURABLE COMPOSITION, DENTURE BASE, AND PLATE DENTURE MITSUI CHEMICALS, INC. (JP) 2018-01-18 US disclosed
US-20180016454-A1 CURABLE COMPOSITION, CURABLE INK, METHOD FOR FORMING TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGES, APPARATUS FOR FORMING TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGES, CURED PRODUCT, STRUCTURAL BODY, AND PROCESSED PRODUCT RICOH COMPANY, LTD. (JP) 2018-01-18 US disclosed
US-9790381-B2 Active energy ray curable composition, stereoscopic modeling material, active energy ray curable ink, inkjet ink, active energy ray curable composition container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured product, and processed product RICOH COMPANY, LTD. (JP) 2017-10-17 US disclosed
US-20170137653-A1 ULTRAVIOLET-CURABLE COMPOSITION AND RECORDED MATTER SEIKO EPSON CORPORATION (JP) 2017-05-18 US disclosed
US-20170137642-A1 ULTRAVIOLET-CURABLE COMPOSITION AND RECORDED MATTER SEIKO EPSON CORPORATION (JP) 2017-05-18 US disclosed
US-9597914-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-03-21 US disclosed
US-20170028743-A1 PRODUCTION METHOD OF RECORDING MATERIAL, AND RECORDING MATERIAL SEIKO EPSON CORPORATION (JP) 2017-02-02 US disclosed
US-9498975-B2 Production method of recording material, and recording material SEIKO EPSON CORPORATION (JP) 2016-11-22 US disclosed
US-20160326387-A1 ACTIVE ENERGY RAY CURABLE COMPOSITION, STEREOSCOPIC MODELING MATERIAL, ACTIVE ENERGY RAY CURABLE INK, INKJET INK, ACTIVE ENERGY RAY CURABLE COMPOSITION CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD, CURED PRODUCT, AND PROCESSED PRODUCT RICOH COMPANY, LTD. (JP) 2016-11-10 US disclosed
US-20160264794-A1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT SEIKO EPSON CORPORATION (JP) 2016-09-15 US disclosed
EP-3067395-A1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER Seiko Epson Corporation (JP) 2016-09-14 EP disclosed
EP-3067396-A1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT Seiko Epson Corporation (JP) 2016-09-14 EP disclosed
US-20160257827-A1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT SEIKO EPSON CORPORATION (JP) 2016-09-08 US disclosed
EP-2871062-B1 Production method of recording material, and recording material SEIKO EPSON CORP (JP) 2016-08-17 EP disclosed
US-9323143-B2 Controlling template surface composition in nano-imprint lithography CANON NANOTECHNOLOGIES, INC. (US) 2016-04-26 US disclosed
EP-2188831-B1 REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS CANON NANOTECHNOLOGIES INC (US) 2015-12-02 EP disclosed
US-20150224795-A1 INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2015-08-13 US disclosed
CN-103080815-B Optical element LG CHEM, LTD. (KR) 2015-07-29 CN disclosed
EP-2871062-A1 Production method of recording material, and recording material Seiko Epson Corporation (JP) 2015-05-13 EP disclosed
US-20150125671-A1 PRODUCTION METHOD OF RECORDING MATERIAL, AND RECORDING MATERIAL SEIKO EPSON CORPORATION (JP) 2015-05-07 US disclosed
CN-103930820-A Optical device LG CHEMICAL LTD 2014-07-16 CN disclosed
CN-103221876-A Optical element LG CHEMICAL LTD 2013-07-24 CN disclosed
CN-103080815-A Optical element LG CHEMICAL LTD 2013-05-01 CN disclosed
WO-2009099627-A1 CONTROLLING TEMPLATE SURFACE COMPOSITION IN NANO-IMPRINT LITHOGRAPHY MOLECULAR IMPRINTS, INC. (US) 2009-08-13 WO disclosed
US-20090197057-A1 Controlling Template Surface Composition in Nano-Imprint Lithography MOLECULAR IMPRINTS, INC. (US) 2009-08-06 US disclosed
US-20090197057-A1 Controlling Template Surface Composition in Nano-Imprint Lithography MOLECULAR IMPRINTS, INC. (US) 2009-08-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10973742-B2 Photocurable composition, denture base, and plate denture PAM, ARCN1, COPE ALDH1A1 787/4885MEN1 1047/4885LMNA 2508/4885
US-10562995-B2 Photocurable composition, denture base, and plate denture PAM, COPE, SMCHD1 ALDH1A1 674/4885MEN1 980/4885LMNA 2017/4885
US-20190175455-A1 PHOTOCURABLE COMPOSITION, DENTURE BASE, AND PLATE DENTURE PAM, ARCN1, COPE ALDH1A1 787/4885MEN1 1047/4885LMNA 2508/4885
US-10709530-B2 Photocurable composition, denture base, and plate denture PAM, COPE, ARCN1 ALDH1A1 947/4885MEN1 1106/4885LMNA 2404/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.