Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.35 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.35 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.35 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.34 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | RBBP9 | O75884 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10679441 | 0.92 | ALDH1A1 (0.44) | SMN1; SMN2ALDH1A1HTTKMT2ATDP1 | |
| SCHEMBL1480017 | 0.83 | ALDH1A1 (0.41) | ALDH1A1TDP1TSHREPHX1 | |
| SCHEMBL11211040 | 0.83 | TDP1 (0.42) | SMN1; SMN2CES2CES1ALDH1A1CHRM2 | |
| SCHEMBL28979971 | 0.81 | TDP1 (0.44) | SMN1; SMN2CES2CES1ALDH1A1CHRM2 | |
| SCHEMBL31495862 | 0.79 | CHRM2 (0.45) | SMN1; SMN2CES2CES1ALDH1A1CHRM2 | |
| SCHEMBL776393 | 0.79 | CES2 (0.46) | SMN1; SMN2CES2CES1ALDH1A1CHRM2 | |
| SCHEMBL12517329 | 0.79 | CES2 (0.46) | SMN1; SMN2CES2CES1ALDH1A1CHRM2 | |
| SCHEMBL3483420 | 0.79 | SMN1; SMN2 (0.48) | SMN1; SMN2CES2CES1ALDH1A1CHRM2 | |
| SCHEMBL28222231 | 0.78 | TSHR (0.47) | ALDH1A1HTTTDP1POLBTSHR | |
| SCHEMBL6939791 | 0.78 | CES2 (0.55) | SMN1; SMN2CES2CES1ALDH1A1CHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116981758-A | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | 英菲诺姆国际有限公司 | 2023-10-31 | — | — | CN | disclosed |
| US-10968299-B2 | Copolymer and aqueous coating composition using same | ADEKA CORPORATION (JP) | 2021-04-06 | — | — | US | disclosed |
| CN-107001532-B | Copolymer and aqueous coating composition using same | 株式会社ADEKA | 2020-11-20 | — | — | CN | disclosed |
| EP-3231822-B1 | COPOLYMER AND AQUEOUS COATING COMPOSITION USING SAME | ADEKA CORP (JP) | 2020-05-27 | — | — | EP | disclosed |
| EP-3231822-A1 | COPOLYMER AND AQUEOUS COATING COMPOSITION USING SAME | Adeka Corporation (JP) | 2017-10-18 | — | — | EP | disclosed |
| US-20170247488-A1 | COPOLYMER AND AQUEOUS COATING COMPOSITION USING SAME | ADEKA CORPORATION (JP) | 2017-08-31 | — | — | US | disclosed |
| US-20170160637-A9 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2017-06-08 | — | — | US | disclosed |
| US-20160109801-A1 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2016-04-21 | — | — | US | disclosed |
| US-9261789-B2 | Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method | JSR CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-8697344-B2 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | JSR CORPORATION (JP) | 2014-04-15 | — | — | US | disclosed |
| CN-103630961-A | Polarizer protective film, polarizing plate and image display device | NITTO DENKO CORP | 2014-03-12 | — | — | CN | disclosed |
| US-20130216961-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2013-08-22 | — | — | US | disclosed |
| US-8431332-B2 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20120021359-A1 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-01-26 | — | — | US | disclosed |
| CN-101932959-A | Polarizer protective film, polarizing plate, and image display device | NITTO DENKO CORP | 2010-12-29 | — | — | CN | disclosed |
| US-20100255416-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |