SCHEMBL4244344

SCHEMBL4244344

COC(c1ccccc1)C([SiH3])(OC)OC

nearest known ligand 0.41

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.36
EPHX1 P07099 2/20 0.35
THRB P10828 1/20 0.35
LTA4H P09960 1/20 0.32
DPP4 P27487 2/20 0.32
F2 P00734 1/20 0.32
TSHR P16473 1/20 0.32
CA4 P22748 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3203986 0.89 ALDH1A1 (0.31) TSHR
SCHEMBL230733 0.78 KMT2A (0.33) KMT2AEPHX1THRB
SCHEMBL14663964 0.77 ATM (0.40) KMT2AEPHX1THRB
SCHEMBL11911981 0.77 ATM (0.40) KMT2AEPHX1THRB
SCHEMBL12344306 0.77 ATM (0.40) KMT2AEPHX1THRB
SCHEMBL10512562 0.77 KMT2A (0.39) KMT2AEPHX1THRBTSHR
SCHEMBL30261324 0.77 DPP4 (0.36) KMT2AEPHX1THRBDPP4F2
SCHEMBL30296865 0.77 KMT2A (0.35) KMT2AEPHX1THRB
SCHEMBL7715366 0.76 NPSR1 (0.43) KMT2AEPHX1THRB
SCHEMBL12199974 0.76 NPSR1 (0.43) KMT2AEPHX1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9534087-B2 Method for manufacturing polysilsesquioxane by using carbon dioxide solvent and polysilsesquioxane manufactured using the same KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2017-01-03 US claimed
US-20250033983-A1 METHOD FOR MAKING HOLLOW SILICA PARTICLES IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2025-01-30 US disclosed
US-12139411-B2 Hydrolytic and calcination method for forming hollow silica particles IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2024-11-12 US disclosed
US-12102716-B2 Method for making solid silica spheres IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2024-10-01 US disclosed
US-12102717-B2 Hollow silica spheres with nested iron oxide particles IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2024-10-01 US disclosed
US-12102718-B2 Multistage calcination method for making hollow silica spheres IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2024-10-01 US disclosed
US-20240294387-A1 HYDROLYTIC AND CALCINATION METHOD FOR FORMING HOLLOW SILICA PARTICLES IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2024-09-05 US disclosed
US-20240216279-A1 MULTISTAGE CALCINATION METHOD FOR MAKING HOLLOW SILICA SPHERES IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2024-07-04 US disclosed
US-12017922-B2 Water-based hydrolysis method for forming hollow particles IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2024-06-25 US disclosed
US-20240147741-A1 INORGANIC/ORGANIC HYBRID COMPLEMENTARY SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME THE UNIVERSITY OF TOKYO (JP) 2024-05-02 US disclosed
WO-2020257885-A1 NANOWIRE MEDIATED DELIVERY SYSTEM AND METHODS COMPRISING THE SAME COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) 2020-12-30 WO disclosed
US-20200345642-A1 METHOD FOR TREATING NEOPLASMS USING HOLLOW SILICA SPHERES IMAM ABDULRAHMAN BIN FAISAL UNIVERSITY (SA) 2020-11-05 US disclosed
US-9534087-B2 Method for manufacturing polysilsesquioxane by using carbon dioxide solvent and polysilsesquioxane manufactured using the same KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2017-01-03 US disclosed
CN-103864969-B Modified high-cis conjugated diene polymer, method for modifying high-cis conjugated diene polymer, and rubber composition 奇美实业股份有限公司 2016-12-28 CN disclosed
WO-2016112315-A2 NANOWIRE ARRAYS FOR NEUROTECHNOLOGY AND OTHER APPLICATIONS PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2016-07-14 WO disclosed
CN-103864969-A Modified high-cis conjugated diene polymer, method for modifying high-cis conjugated diene polymer, and rubber composition CHI MEI CORP 2014-06-18 CN disclosed
WO-2014031171-A1 USE OF NANOWIRES FOR DELIVERING BIOLOGICAL EFFECTORS INTO IMMUNE CELLS PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2014-02-27 WO disclosed
WO-2013047257-A1 PHOTOELECTRIC CONVERSION DEVICE SUBSTRATE AND PHOTOELECTRIC CONVERSION DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 WO disclosed
US-20090206453-A1 Method for Preparing Modified Porous Silica Films, Modified Porous Silica Films Prepared According to This Method and Semiconductor Devices Fabricated Using the Modified Porous Silica Films ULVAC, INC. (JP) 2009-08-20 US disclosed
EP-1855313-A1 PROCESS FOR PRODUCING MODIFIED POROUS SILICA FILM, MODIFIED POROUS SILICA FILM OBTAINED BY THE PROCESS, AND SEMICONDUCTOR DEVICE EMPLOYING THE MODIFIED POROUS SILICA FILM ULVAC, INC. (JP) 2007-11-14 EP disclosed