Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 1/20 | 0.35 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.35 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10395575 | 0.93 | DNM1 (0.33) | TSHR | |
| SCHEMBL107818 | 0.85 | HSD17B10 (0.32) | — | |
| SCHEMBL15302773 | 0.84 | ADRB2 (0.33) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL429530 | 0.81 | ADRB2 (0.35) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL1314084 | 0.81 | ADRB2 (0.35) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL426692 | 0.80 | ADRB2 (0.38) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL28767138 | 0.79 | ADRB2 (0.33) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL1315243 | 0.79 | ADRB2 (0.33) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL1315300 | 0.79 | ADRB2 (0.33) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL5833769 | 0.77 | ADRB2 (0.32) | ADRB2ADRB1ADRB3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 254 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240262964-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2024-08-08 | — | — | US | disclosed |
| EP-4361201-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2024-05-01 | — | — | EP | disclosed |
| CN-117413005-A | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2024-01-16 | — | — | CN | disclosed |
| CN-115244109-B | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2023-07-07 | — | — | CN | disclosed |
| US-20230167244-A1 | METHOD OF PRODUCING SILICONE POLYMER | TORAY FINE CHEMICALS CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| EP-4119596-A1 | METHOD FOR PRODUCING SILICONE POLYMER | Toray Fine Chemicals Co., Ltd. (JP) | 2023-01-18 | — | — | EP | disclosed |
| WO-2022270336-A1 | METHOD FOR PRODUCING SILICONE POLYMER | 東レ・ファインケミカル株式会社 | 2022-12-29 | — | — | WO | disclosed |
| CN-115244109-A | Method for producing siloxane polymer | 东丽精细化工株式会社 | 2022-10-25 | — | — | CN | disclosed |
| CN-115145113-A | Composition for forming coating, laminate coated with same, fingerprint authentication sensor using laminate, and method for forming cured coating | 阪田油墨株式会社 | 2022-10-04 | — | — | CN | disclosed |
| CN-112955514-B | Composition for forming coating film, glass substrate coated with the composition, and touch panel using the glass substrate | 阪田油墨株式会社 | 2022-09-06 | — | — | CN | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| US-6235101-B1 | SILICON HYDROLYZATE, METAL CHELATE, ORGANIC SOLVENT AND BETA DIKETONE FOR FILMS | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0921561-A2 | Composition for film formation and film | JSR Corporation (JP) | 1999-06-09 | — | — | EP | disclosed |