SCHEMBL4253645

SCHEMBL4253645

CCN(CC)C(CC(C)C)OC(=O)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PGR P06401 1/20 0.51
ADRA2A P08913 1/20 0.51
ADRA2B P18089 1/20 0.51
HTR2A P28223 1/20 0.51
HRH1 P35367 1/20 0.51
KCNH2 Q12809 1/20 0.51
TSHR P16473 2/20 0.45
TP53 P04637 1/20 0.45
PDCD1 Q15116 1/20 0.44
CD274 Q9NZQ7 1/20 0.44
LMNA P02545 4/20 0.42
ALDH1A1 P00352 3/20 0.42
NPC1 O15118 3/20 0.42
SMN1; SMN2 Q16637 3/20 0.42
RAB9A P51151 2/20 0.42
HTT P42858 1/20 0.42
CYP1A2 P05177 2/20 0.41
CYP2D6 P10635 2/20 0.41
CYP2C19 P33261 1/20 0.41
POLB P06746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL83439 0.84 TSHR (0.47) TSHRTP53PDCD1CD274LMNA
SCHEMBL611039 0.81 PGR (0.57) PGRADRA2AADRA2BHTR2AHRH1
SCHEMBL27628287 0.79 LMNA (0.55) TSHRTP53PDCD1CD274LMNA
Acetic Acid SCHEMBL28346369 0.78 PGR (0.54) PGRADRA2AADRA2BHTR2AHRH1
SCHEMBL569415 0.76 TSHR (0.52) TSHRTP53PDCD1CD274LMNA
SCHEMBL571292 0.76 TSHR (0.52) TSHRTP53PDCD1CD274LMNA
SCHEMBL28980763 0.76 CA12 (0.46) TSHRPDCD1CD274LMNAALDH1A1
SCHEMBL25982607 0.74 TSHR (0.50) TSHRTP53PDCD1CD274LMNA
SCHEMBL30645239 0.74 TSHR (0.50) TSHRTP53PDCD1CD274LMNA
SCHEMBL29672356 0.74 MAPT (0.45) TSHRTP53PDCD1CD274LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10354932-B2 Semiconductor device including semiconductor element and redistribution layer electrically connected thereto, and method of manufacturing the device ASAHI KASEI KABUSHIKI KAISHA (JP) 2019-07-16 US disclosed
CN-109789715-A Use the manufacturing method and lithographic printing ink sets of the printed article of lithographic printing ink 东丽株式会社 2019-05-21 CN disclosed
US-20180342432-A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE DEVICE ASAHI KASEI KABUSHIKI KAISHA (JP) 2018-11-29 US disclosed
CN-107850844-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2018-03-27 CN disclosed
EP-2042304-B1 PLATE MAKING METHOD AND PLANOGRAPHIC PRINTING PLATE KONICA MINOLTA HOLDINGS INC (JP) 2013-01-02 EP disclosed
US-20090186201-A1 PLATE MAKING METHOD AND PLANOGRAPHIC PRINTING PLATE KONICA MINOLTA HOLDINGS, INC. (JP) 2009-07-23 US disclosed
EP-2042304-A1 METHOD OF PLATE MAKING AND LITHOGRAPHIC PRINTING PLATE Konica Minolta Holdings, Inc. (JP) 2009-04-01 EP disclosed
EP-0775940-B2 USE OF A PHOTOSENSITIVE PASTE, METHOD OF PRODUCING A PLASMA DISPLAY AND PLASMA DISPLAY OBTAINABLE THEREBY TORAY INDUSTRIES (JP) 2004-01-02 EP disclosed
US-6576391-B1 Pattern formation with high aspect ratio andaccuracy by controlling refractive index of the organic component and glass particles in the paste to reduce reflection and scattering at the interfaces TORAY INDUSTRIES, INC. (JP) 2003-06-10 US disclosed
US-6507148-B1 Electrical and electronic apparatus having coatings of glass or ceramic particles and addition polymers on glass panels; patterns having high accuracy and aspect ratio obtained by controlling the refractive index of the components TORAY INDUSTRIES, INC. (JP) 2003-01-14 US disclosed
US-6197480-B1 USED FOR PATTERN FORMATION FOR DISPLAYS, SUCH AS PLASMA DISPLAY AND MATRIX-ADDRESSED PLASMA LIQUID CRYSTAL DISPLAY, AND CIRCUIT MATERIALS; LARGE-SIZE TV SETS AND COMPUTER DISPLAYS; ACCURACY; ASPECT RATIO TORAY INDUSTRIES, INC. (JP) 2001-03-06 US disclosed
EP-0775940-B1 PHOTOSENSITIVE PASTE, PLASMA DISPLAY, AND PROCESS FOR THE PRODUCTION THEREOF TORAY INDUSTRIES (JP) 2000-04-05 EP disclosed
EP-0775940-A1 PHOTOSENSITIVE PASTE, PLASMA DISPLAY, AND PROCESS FOR THE PRODUCTION THEREOF TORAY INDUSTRIES, INC. (JP) 1997-05-28 EP disclosed