⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL335750 | 0.97 | — | — | |
| Carbon Monoxide SCHEMBL3054475 | 0.87 | — | — | |
| SCHEMBL30105462 | 0.83 | PTPN1 (0.39) | — | |
| Toluene SCHEMBL4785171 | 0.79 | LMNA (0.46) | — | |
| SCHEMBL14793503 | 0.79 | — | — | |
| SCHEMBL8758 | 0.73 | — | — | |
| SCHEMBL895220 | 0.73 | — | — | |
| SCHEMBL2409777 | 0.69 | — | — | |
| SCHEMBL11792566 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL28710350 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8658249-B2 | Heteroleptic iridium precursors to be used for the deposition of iridium-containing films | L'Air Liquide, SociétéAnonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2014-02-25 | — | — | US | disclosed |
| US-20130040056-A1 | HETEROLEPTIC IRIDIUM PRECURSORS TO BE USED FOR THE DEPOSITION OF IRIDIUM-CONTAINING FILMS | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2013-02-14 | — | — | US | disclosed |
| US-8309174-B2 | Heteroleptic iridium precursors to be used for the deposition of iridium-containing films | L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2012-11-13 | — | — | US | disclosed |
| US-20090258144-A1 | Heteroleptic Iridium Precursors To Be Used For The Deposition Of Iridium-Containing Films | AMERICAN AIR LIQUIDE, INC. (US) | 2009-10-15 | — | — | US | disclosed |