⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL11048334 | 0.73 | — | — | |
| SCHEMBL2575551 | 0.69 | — | — | |
| SCHEMBL4574109 | 0.61 | — | — | |
| SCHEMBL3372558 | 0.60 | — | — | |
| SCHEMBL19030878 | 0.60 | — | — | |
| SCHEMBL4225062 | 0.58 | — | — | |
| SCHEMBL16579584 | 0.57 | ALDH1A1 (0.33) | — | |
| SCHEMBL13218706 | 0.56 | KDM4E (0.38) | — | |
| SCHEMBL1101108 | 0.55 | — | — | |
| SCHEMBL2138122 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7534550-B2 | Positive resist composition and process for formation of resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-19 | — | — | US | disclosed |