SCHEMBL4258778

SCHEMBL4258778

C=COC(C)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9483747 0.98
SCHEMBL6693176 0.98
SCHEMBL17417862 0.93
Acrylic Acid SCHEMBL9155014 0.86 THRB (0.33)
Methacrylic Acid SCHEMBL8822896 0.85 THRB (0.32)
SCHEMBL17417871 0.84
SCHEMBL8902374 0.80
SCHEMBL8902831 0.78
SCHEMBL28560512 0.77
SCHEMBL28564276 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090252932-A1 ACTINIC ENERGY RAY CURABLE RESION COMPOSITION AND USE THEREOF KURARAY CO., LTD. (JP) 2009-10-08 US disclosed
US-7005231-B2 Positive type radiosensitive composition and method for forming pattern JSR CORPORATION (JP) 2006-02-28 US disclosed
US-20040197698-A1 Positive type radiosensitive composition and method for forming pattern JSR CORPORATION (JP) 2004-10-07 US disclosed
EP-1411390-A1 POSITIVE TYPE RADIOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN JSR Corporation (JP) 2004-04-21 EP disclosed