SCHEMBL425903

SCHEMBL425903

CCCCOc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 4/20 0.63
KCNA3 P22001 1/20 0.50
CYP2D6 P10635 2/20 0.49
CYP1A2 P05177 1/20 0.49
CYP19A1 P11511 1/20 0.49
CYP2C9 P11712 1/20 0.49
CYP2C19 P33261 1/20 0.49
MLNR O43193 1/20 0.47
NR1I2 O75469 1/20 0.47
ESR1 P03372 1/20 0.47
NR3C1 P04150 1/20 0.47
PGR P06401 1/20 0.47
ADRB2 P07550 1/20 0.47
CHRM2 P08172 1/20 0.47
ADRB1 P08588 1/20 0.47
HTR1A P08908 1/20 0.47
ADRA2A P08913 1/20 0.47
ADORA3 P0DMS8 1/20 0.47
CHRM1 P11229 1/20 0.47
DRD2 P14416 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3212615 1.00 LTA4H (0.63) LTA4HKCNA3CYP2D6CYP1A2CYP19A1
Iodide SCHEMBL6924529 0.98 LTA4H (0.61) LTA4HKCNA3CYP2D6CYP1A2CYP19A1
Bromide SCHEMBL3130299 0.98 LTA4H (0.61) LTA4HKCNA3CYP2D6CYP1A2CYP19A1
SCHEMBL482139 0.95 LTA4H (0.64) LTA4HKCNA3MLNRNR1I2ESR1
SCHEMBL9333524 0.95 LTA4H (0.64) LTA4HKCNA3MLNRNR1I2ESR1
SCHEMBL2437395 0.95 LTA4H (0.64) LTA4HKCNA3MLNRNR1I2ESR1
SCHEMBL482308 0.95 LTA4H (0.64) LTA4HKCNA3MLNRNR1I2ESR1
SCHEMBL482305 0.95 LTA4H (0.64) LTA4HKCNA3MLNRNR1I2ESR1
SCHEMBL1060109 0.93 LTA4H (0.56) LTA4HKCNA3CYP2D6CYP1A2CYP19A1
Methane SCHEMBL2436452 0.93 LTA4H (0.62) LTA4HKCNA3MLNRNR1I2ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 605 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7297724-B2 Photoiniators having triarylsulfonium and arylsulfinate ions 3M INNOVATIVE PROPERTIES COMPANY (US) 2007-11-20 US claimed
JP-2007507580-A 2007-03-29 JP claimed
CN-1859893-A Photoinitiators with triarylsulfonium ions and arylsulfinate ions 3M INNOVATIVE PROPERTIES CO (US) 2006-11-08 CN claimed
US-7122294-B2 Photoacid generators with perfluorinated multifunctional anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-10-17 US claimed
EP-1684698-A1 PHOTOINITIATORS HAVING TRIARYLSULFONIUM AND ARYLSULFINATE IONS 3M Innovative Properties Company (US) 2006-08-02 EP claimed
US-7078444-B2 Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-07-18 US claimed
US-20060111463-A1 PHOTOINIATORS HAVING TRIARYLSULFONIUM AND ARYLSULFINATE IONS 3M INNOVATIVE PROPERTIES COMPANY 2006-05-25 US claimed
US-7026367-B2 Photoiniators having triarylsulfonium and arylsulfinate ions 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-04-11 US claimed
EP-1625447-A2 PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS 3M Innovative Properties Company (US) 2006-02-15 EP claimed
US-20050158655-A1 Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY 2005-07-21 US claimed
WO-2005034885-A1 PHOTOINITIATORS HAVING TRIARYLSULFONIUM AND ARYLSULFINATE IONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2005-04-21 WO claimed
US-20050070621-A1 Photoiniators having triarylsulfonium and arylsulfinate ions 3M INNOVATIVE PROPERTIES COMPANY 2005-03-31 US claimed
US-6841333-B2 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2005-01-11 US claimed
WO-2004107051-A2 PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2004-12-09 WO claimed
US-20040234888-A1 Photoacid generators with perfluorinated multifunctional anions 3M INNOVATIVE PROPERTIES COMPANY 2004-11-25 US claimed
US-20040087690-A1 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY 2004-05-06 US claimed
US-20250199405-A1 CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT YCCHEM CO., LTD. (KR) 2025-06-19 US disclosed
CN-114380929-B Functionalized (co) polymers for adhesive systems 德莎欧洲股份公司 2024-02-06 CN disclosed
WO-1998014497-A1 MONOMERS, OLIGOMERS AND POLYMERS WITH TERMINAL OXIRANE GROUPS, METHOD OF PREPARATION AND POLYMERISATION UNDER RADIATION EXPOSURE UCB, S.A. (BE) 1998-04-09 WO disclosed
EP-0701171-A1 Resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-03-13 EP disclosed